本研究目的為探討氧化鉻(CrOx)薄膜在可見光波段及近紅外光波段之光學特性，以獲得在可見光波段650 nm位置吸收效果最佳(消光係數大)且在近紅外光波段1400 nm位置濾光效果最佳(穿透率低)之參數，應用在單層吸收膜及衰減濾光片上。
本研究使用電子束蒸鍍系統鍍製氧化鉻薄膜，以光譜儀量測反射率及穿透率，再使用數值方法分析光學常數。接下來以SEM及XRD檢測膜層結構、以XPS檢測組成成份及使用四點探針儀量測片電阻值。
本研究探討的製程變因包含製程壓力(通氧量)、製程溫度及離子源的使用與否。在製程壓力部份，隨通氧量增加，金屬相降低，薄膜穿透率逐漸上升；在製程溫度部份，在200 ℃時，穿透率略為下降，並未出現柱狀結晶；在離子源製程部份，使用Ar或O2離子源助鍍後，穿透率均有上升情形，其中以O2離子源較為明顯，膜層柱狀結構較少，膜層堆積緻密程度有所提升。由實驗結果得知，在製程壓力1×〖10〗^(-3) Pa、製程溫度200 ℃、未使用離子源助鍍條件下鍍製之氧化鉻薄膜，在650 nm處消光係數為0.048；在1400 nm處穿透率為68%，為本實驗獲得之最佳參數。

The purpose of this study is to investigate the optical properties of chromium oxide film in visible light and near infrared (NIR) region, to obtain the best absorbing effect (high extinction coefficient) at 650 nm and best filter effect (low transmittance) at 1400 nm. It can be applied in monolayer absorbing film and neutral density filter (ND filter).
The chromium oxide film is deposited by electron-beam evaporation system. The reflectance and transmittance are measured by spectrometer, then numerical method is used to analyze optical constants. The structure is detected by SEM and XRD; the composition is detected by XPS and sheet resistance is measured by four-point probe.
In this study, the process parameters include process pressure (oxygen flow rate), process temperature and ion beam assisted deposition (IAD). For the process pressure, the metal phase decreases and the transmittance increases with the oxygen flow rate. For the process temperature, there is a slight decrease in transmittance when the process temperature is 200 ℃, and columnar crystals can not be found in the structure. For the IAD, the transmittance increases after the Ar or O2 IAD process is used, the O2 IAD process is more obvious. The columnar structure in the film under O2 IAD process is less than the film without O2 IAD process, so the density of film deposition has increased. The results show that the best parameter for the process pressure is 1×〖10〗^(-3) Pa; for the process temperature is 200 ℃, without IAD process. At 650 nm, the extinction coefficient is 0.048; at 1400 nm, the transmittance is 68%.

摘要 I
Abstract II
致謝 III
目錄 IV
表目錄 VII
圖目錄 VIII
第一章 前言 1
第二章 文獻回顧 3
2.1 吸收膜 3
2.2 光學厚度與物理厚度 12
2.3 光學薄膜的反射與透射 12
2.3.1 單層膜的反射與透射 12
2.3.2 多層膜的反射與透射 15
2.4 光學常數分析 17
2.4.1 反射率函數及穿透率函數 17
2.4.2 光學常數分析流程 19
2.5 原子鍵結 20
2.6 單層氧化鉻薄膜 20
2.6.1 製程壓力(通氧量)變因 20
2.6.2 製程溫度變因 21
2.7 離子源助鍍 25
第三章 研究動機 27
第四章 實驗方法與製程 29
4.1 實驗儀器與材料 29
4.1.1 電子束蒸鍍系統 29
4.1.2 光譜儀 30
4.1.3 掃描式電子顯微鏡 32
4.1.4 X光繞射儀 32
4.1.5 高解析X光光電子能譜儀 34
4.1.6 四點探針儀 35
4.1.7 實驗材料與氣體 36
4.2 實驗流程 37
4.3 實驗製程 38
4.3.1 試片清潔 38
4.3.2 氧化鉻薄膜鍍製 38
4.3.3 量測與分析 40
第五章 實驗結果與討論 41
5.1 製程壓力(通氧量)對光學特性的影響 41
5.2 製程溫度對光學特性的影響 53
5.3 離子源助鍍對光學特性的影響 62
第六章 結論與未來展望 79
6.1 結論 79
6.2 未來展望 80
參考文獻 81

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