光微機電(MOEMS)製程技術相較於傳統光學儀器的製造有著許多優點，其中原件的微小化可使光學儀器微縮至微米尺度，這不僅縮小了元件的尺寸，同時也可藉由晶圓製造的技術使其量產化、降低製造成本，另一方面，微機電技術可與邏輯電路(IC)進行整合，使元件的控制、感應與計算統整在一個晶片上，增加了功能性並大幅地縮減了儀器的體積。 隨著IC製造技術的進步與物聯網的推動，以光微機電技術製造的光感測器商業化的可能性大幅上升，這種微型光檢測器的性能與精確度雖然不及傳統光學儀器，然而低廉製造成本與可攜帶的優點增加了其功能性與商業價值。
本實驗是以光微機電系統製作微型可調變式Fabry-Pérot濾波器，並創新地導入了氧化鋅做為元件的犧牲層，此可調變式濾波器量得的可調變範圍為2180 nm至1992 nm的近紅外光波段，操作電壓在0至7.5 V的範圍內，最大穿透率約為41.6%。

The Fabry-Pérot filter (FPF) fabricated by the technology of micro-opto-electro-mechanical system (MOEMS) provides several advantages such as miniaturization and multiplicity. Devices can be scaled down by the development of miniaturization with the improvement of integrated circuits (ICs) fabrication. Multiplicity enables the devices to be mass produced in thousands components on a single wafer, as a result, it reduces the fabrication cost and makes the commercialization of micro-spectrometers possible. The micro-scale devices create new applications in micro- spectroscopy, as a result, the FPF fabricated by MOEMS technology provides a promising opportunity for micro-spectroscope to be commercialized.
In this work, the Fabry-Pérot filters with a large aperture size of 300 μm was designed and fabricated. Another feature of this work is that the zinc oxide (ZnO) was utilized as the sacrificial layer, which would be etched by diluted hydrochloric (HCl) acid in the releasing step. The measured transmittance of a released FPF was 41.6% with referred medium of bare silicon wafer at no applied voltage, and the measured tuning was from 2180 to 1992 nm in the NIR range at the applied voltage from 0 to 7.5 V.

中文摘要
ABSTRACT
誌 謝
CONTENTS
LIST OF FIGURES
LIST OF TABLES
Chapter 1 Introduction
1.1 Origin and Development
1.2 Motivation and Purpose
Chapter 2 The Basis of Theory
2.1 Micro-Opto-Electro-Mechanical Systems
2.2 Distributed Bragg Reflector
2.3 Fabry-Pérot Filter
Chapter 3 Design and Fabrication
3.1 Design of the Mask
3.2 Simulation of the Optical Properties
3.3 Process Flow
3.4 Instruments for measurement
3.4.1 Micro-point optical measurement system
3.4.2 Monochromator
Chapter 4 Results and Discussion
4.1 Properties of distributed Bragg reflector
4.1.1 Design Concept of the Distributed Bragg Reflector
4.1.2 Deposition of the Distributed Bragg Reflector
4.2 Analysis of Micro-structure Release and Zinc Oxide Sacrificial layer
4.2.1 Basis of Microstructure release
4.2.2 Deposition of Zinc Oxide Sacrificial Layer
4.2.3 Solution for the Stiction Phenomenon
4.3 Discussion of Fabrication Issues
4.3.1 The Effects of Residual Stress
4.3.2 Deposition of Silicon Nitride
4.3.3 Results of Fabricated Fabry-Pérot Filter
4.4 Characteristics of Optical Properties
4.4.1 The Transmittance measured by Micro-point optics system
4.4.2 The Transmittance measured by monochromator
4.5 Characteristics of mechanical Properties
4.5.1 The derivation of the stiffness of cantilevers
4.5.2 The snap-down effect
Chapter 5 Conclusion
REFERENCE

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