近年來，隨著奈米科技的蓬勃發展，許多奈米結構的製作方法也相繼被發明出來，如黃光微影、電子束微影、奈米壓印、雷射干涉微影等。其中雷射干涉微影(Laser Interference Lithography)是由兩道以上的雷射光相互重疊以形成干涉，並以光敏感材料紀錄所形成的干涉圖形以產生相對應的週期性奈米結構。在製作週期性奈米結構上，相較於其他方法，雷射干涉微影可以進行較大面積的曝光，同時具有無光罩、高產能等優勢，因此在許多相關應用上，如光柵、光子晶體等，雷射干涉微影有著相當高的發展潛力。
然而一般雷射的輸出強度呈現高斯分布，將雷射光束擴大進行大面積曝光的時候，光束中心的光強度會遠高於光束邊緣的強度，造成相同的曝光時間內，整片曝光基板的結構均勻度較差，甚至導致中央部分的過曝或是基板邊緣曝光不足的現象。本研究的目的是設計一光束平坦化裝置，可以使原本強度呈高斯分布的雷射光，在擴束並通過本裝置後，形成能量均勻分布之平頂光束，並用於雷射干涉微影以達到較佳的曝光效果。

Recently, with the rapid development of nanotechnology, many methods of making nanostructure are also invented, such as photolithography, electron beam lithography, nanoimprint lithography, laser interference lithography. Among these methods, laser interference lithography overlap two or more than two laser beams to form interference pattern, and then use light sensitive material to record the pattern in order to make periodic nanostructures. Compare to other methods, laser interference lithography is more convenient to do large area exposure, and also with advantage of high production capability and no need of mask. Due to these advantages, laser interference lithography has a rather high development potential in some related application like optical grating and photonic crystal fabrication.
However, the output intensity distribution of normal laser has a Gaussian distribution, when we expand the laser beam to do a large area exposure, the light intensity at the center part of laser beam will be much higher than the intensity of the edge area. This will lead to a bad uniformity of the structure, and even cause an overexposure at the center or underexposure on the edge. In this research, we are going to design a laser beam flattening device. When a laser beam is expanded and pass through this device, the intensity distribution of laser beam will change from Gaussian distribution to a flat top distribution. This flat top laser beam can be used to reach a better quality of exposure in laser interference lithography.

中文摘要
Abstract
目錄
圖目錄
第一章 緒論
1.1 雷射干涉微影
1.2 光束平坦化與文獻回顧
1.3 研究動機與目的
第二章 研究方法
2.1 光的干涉特性
2.2 光束整形的原理
2.3 薄膜干涉原理
2.4 光束整形裝置的設計與架構
第三章 實驗結果與討論
3.1 利用Power meter測量光形在空間上的分布
3.2 利用Beam profiler測量光形在空間上的分布
3.3 光束平坦化裝置對曝光結構均勻度的影響
3.4 使用光束平坦化裝置後的產能比較
第四章 結論
第五章 未來工作
第六章 參考文獻

[1] S. R. J. Brueck, “Optical and interferometric lithography - Nanotechnology enablers,” Proceedings of the IEEE, Vol.93, No.10, October 2005
[2] Q. Xie, M. H. Hong, H. L. Tan, G. X. Chen, L. P. Shi, T. C. Chong, “Fabrication of nanostructures with laser interference lithography,” Journal of Alloys and Compounds 449 (2008) 261-264
[3] Abhijeet Bagal, Chih-Hao Chang, “Fabrication of subwavelength periodic nanostructures using liquid immersion Lloyd’s mirror interference lithography,” Optics Letters, Vol.38, No.14, July 2013
[4] Johannes de Boor, Nadine Geyer, Jo ̈rg V. Wittemann, Ulrich Go ̈sele1 and Volker Schmidt, “Sub-100 nm silicon nanowires by laser interference lithography and metal-assisted etching,” Nanotechnology 21 (2010) 095302
[5] Johannes de Boor, Nadine Geyer, Jo ̈rg V. Wittemann, Ulrich Go ̈sele1 and Volker Schmidt, “Three-beam interference lithography: upgrading a Lloyd's interferometer for single-exposure hexagonal patterning,” Optics Letters, Vol.34, No.12, July 2009
[6] M. Vala, J. Homola, “Flexible method based on four-beam interference lithography for fabrication of large areas of perfectly periodic plasmonic arrays,” Optics Express, Vol.22, No.15, July 2014
[7] C. S. Lim, M. H. Hong, Y. Lin, Q. Xie, B. S. Luk'yanchuk, A. Senthil Kumar, M. Rahman, “Microlens array fabrication by laser interference lithography for super-resolution surface nanopatterning,” Applied Physics Letter 89, 191125 (2006)
[8] Yung-Lang Yang, Chin-Chi Hsu, Tien-Li Chang, Long-Sheng Kuo, Ping-Hei Chen, “Study on wetting properties of periodical nanopatterns by a combinative technique of photolithography and laser interference lithography,” Applied Surface Science 256 (2010) 3683–3687
[9] V. Ramanan, E. Nelson, A. Brzezinski, P. V. Braun, P. Wiltzius, “Three dimensional silicon-air photonic crystals with controlled defects using interference lithography,” Applied Physics Letters 92, 173304 (2008)
[10] Jia Xu, Zuobin Wang, Ziang Zhang, Dapeng Wang, Zhankun Weng, “Fabrication of moth-eye structures on silicon by direct six-beam laser interference lithography,” Journal of Applied Physics 115, 203101 (2014)
[11] Fred M. Dickey, “Laser Beam Shaping,” Optics & Photonics News, April 2003
[12] B. Roy Frieden, “Lossless conversion of a plane Laser wave to a plane wave of uniform irradiance,” Applied Optics, Vol.4, No.11, November 1965
[13] David L. Shealy, Shao-Hua Chao, “Geometric optics-based design of laser beam shapers,” Optical Engineering, Vol. 42 No.11, November 2003
[14] Fabian Duerr, Hugo Thienpont, “Refractive laser beam shaping by means of a functional differential equation based design approach,” Optics Express, Vol.22, No.7, April 2014
[15] S. Zhang, G. Neil, M. Shinn, “Single-element laser beam shaper for uniform flat-top profiles,” Optics Express, Vol.11, No.16, August 2003
[16] Wen Cheng, Wei Han, Qiwen Zhan, “Compact flattop laser beam shaper using vectorial vortex,” Applied Optics, Vol.52, No.19, July 2013
[17] Wei Han, Wen Cheng, Qiwen Zhan, “Flattop focusing with full Poincaré beams under low numerical aperture illumination,” Optics Letters, Vol.36, No.9, May 2011
[18] Haotong Ma, Zejin Liu1, Pu Zhou, Xiaolin Wang, Yanxing Ma, Xiaojun Xu, “Generation of flat-top beam with phase-only liquid crystal spatial light modulators,” Journal of Optics 12 (2010) 045704
[19] Jinyang Liang, Rudolph N. Kohn, Jr., Michael F. Becker, Daniel J. Heinzen, “High-precision laser beam shaping using a binary-amplitude spatial light modulator,” Applied Optics, Vol.94, No.8, March 2010
[20] Mona MAYEH, Faramarz FARAHI, “Laser beam shaping and mode conversion in optical fibers,” Photonic Sensors (2011) Vol.1, No.2, 187–198
[21] Constance Valentin, Pierre Calvet, Yves Quiquempois, Géraud Bouwmans, Laurent Bigot, Quentin Coulombier, Marc Douay, Karen Delplace, Arnaud Mussot, Emmanuel Hugonnot, “Top-hat beam output of a single-mode microstructured optical fiber: Impact of core index depression,” Optics Express, Vol.21, No.20, October 2013
[22] S. Bollanti, P. Di Lazzaroa, D. Murra, “More about the light beam shaping by the integration method,” The European Physical Journal - Applied Physics 28, 179–186 (2004)
[23] Qiang Lin, Ligang Wang, “Optical resonators producing partially coherent flat-top beams,” Optics Communications 175 (2000) 295–300
[24] Sandile Ngcobo, Kamel Ait-Ameur, Igor Litvin, Abdelkrim Hasnaoui, Andrew Forbes, “Tuneable Gaussian to flat-top resonator by amplitude beam shaping,” Optics Express, Vol.21, No.18, September 2013