本研究以管爐製備氮化鎵薄膜，討論其成長溫度和通入氨氣的流量對成長氮化鎵的影響，找出成長氮化鎵薄膜的最佳條件；再使用微波輔助化學氣相沉積法成長鑽石薄膜於氮化鎵基板上，希望透過鑽石薄膜的良好熱傳導性質來改善傳統的發光二極體在氧化鋁上的散熱性質。成長鑽石薄膜的種類包括單層的超奈米晶鑽石薄膜 (Ultranano crystalline diamond, UNCD)及雙層複合膜，雙層複合膜是由兩層不同大小的鑽石晶粒所組合而成，利用掃描式電子顯微鏡(Scanning electron microscope, SEM)觀察其表面形貌及穿透式電子顯微鏡(Transmission electron microscopy, TEM)觀察微結構；再以X光繞射儀確認晶體結構，並利用拉曼光譜儀確定薄膜的性質。 研究結果顯示，以管爐成長氮化鎵的最佳條件在850 ℃下通入30 sccm氨氣成長三小時，在此條件下成長的薄膜具有帄滑的表面有利於成長鑽石薄膜。在氮化鎵的基板上成長鑽石薄膜並不容易，因此我們利用超音波震盪成核增加成核密度，並利用電漿化學氣相沉積法成長UNCD。在雙層膜部分以成長UNCD作為底層，可以成功成長奈米晶鑽石(Nanocrystalline diamond, NCD)/ UNCD雙層膜在氮化鎵薄膜上面，最後以SEM、TEM和拉曼光譜儀分析本實驗製備的薄膜特性。

In this study, we grow GaN film and investigated the influence of growing temperature and the flow rate of ammonia gas on the quality of the synthesized GaN thin film. Subsequently, we used the microwave plasma enhanced chemical vapor deposition to grow diamond film on GaN substrate. The objective of this study is to improve the thermal dissipation of a GaN substrate used in light emitting diode. In this regard, we fabricated the single and hybrid granular structured diamond films on GaN substrate. The hybrid diamond films are composed of diamond films with different grain size. We examined the morphology of the films by scanning electron microscope (SEM) and transmission electron microscope (TEM). The crystal structures of the samples were analyzed by X-ray diffractometer, and the bonding properties were characterized by Raman Spectroscopy. The results showed that the optimal conditions for growing GaN thin film is at 850 ℃ with 30 sccm ammonia gas flow. The film growth under these conditions has a smooth surface which is facilitate the growth of diamond films. For hybrid diamond film, we grow ultranano crystalline diamond (UNCD) as a bottom layer followed by grown nano crystalline diamond(NCD)/ UNCD hybrid structured diamond film. The properties of the as-synthesized NCD/UNCD hybrid diamond film were characterized by SEM, TEM and Raman.

目錄
摘要 ............................................................................................................................ I
Abstract ...................................................................................................................... II
致謝 ......................................................................................................................... III
目錄 ......................................................................................................................... IV
表目錄 .................................................................................................................. VIII
圖目錄 ..................................................................................................................... IX
第一章、緒論 ........................................................................................................... 1
1.1 前言 .............................................................................................................. 1
1.2 研究動機 ...................................................................................................... 1
第二章、文獻回顧 ................................................................................................... 3
2.1 氮化鎵的應用 .......................................................................................... 3
2.2 氮化鎵的結構特性 .................................................................................. 4
2.3 氮化鎵的基板選擇 .................................................................................. 4
2.4 氮化鎵的製程分類 .................................................................................. 6
2.4.1 有機金屬化學氣相沈積法 ............................................................... 6
2.4.2 分子束磊晶 ........................................................................................ 7
2.4.3 氫化物氣相磊晶法 ........................................................................... 7
V
2.4.4 管爐 .................................................................................................... 7
2.5 氮化鎵薄膜的分析 .................................................................................. 8
2.6 鑽石的基本性質 ...................................................................................... 8
2.6.1 鑽石薄膜的結構 ............................................................................... 8
2.6.2 鑽石薄膜的分類 ............................................................................... 9
2.7 鑽石薄膜成核機制 ................................................................................ 11
2.8 化學氣相沉積鑽石薄膜 ........................................................................ 12
2.8.1 在氫氣電漿系統下沉積鑽石薄膜 ................................................. 12
2.8.2 在氰氣電漿系統下沉積鑽石薄膜 ................................................. 13
2.9 鑽石薄膜的分析 .................................................................................... 14
第三章、實驗 ......................................................................................................... 23
3.1 實驗步驟 ................................................................................................ 23
3.1.1 以電漿氮化前處理 ......................................................................... 23
3.1.2 以管爐成長氮化鎵薄膜 ................................................................. 23
3.1.3 以超音波震盪在氮化鎵基板上成膜 ............................................. 24
3.1.4 在氰氣電漿下沉積超奈米晶鑽石 ................................................. 25
3.1.5 在氫氣和氰氣電漿下沉積奈米晶鑽石 ......................................... 25
3.1.6 雙層鑽石薄膜之成長 ..................................................................... 26
3.2 實驗儀器及材料分析儀器 .................................................................... 26
VI
3.2.1 自製簡易管爐.................................................................................. 26
3.2.2 微波電漿輔助化學氣相沉積系統 ................................................. 27
3.2.3 超音波震盪機.................................................................................. 27
3.2.4 掃描式電子顯微鏡 ......................................................................... 27
3.2.5 拉曼光譜分析.................................................................................. 28
3.2.6 X光繞射儀 ...................................................................................... 28
3.2.7 原子力顯微鏡.................................................................................. 29
3.2.8 穿透式電子顯微鏡 ......................................................................... 29
第四章、結果與討論 ............................................................................................. 35
4.1 成長氮化鎵薄膜 .................................................................................... 35
4.1.1 改變氧化鋁表面特性 ..................................................................... 35
4.1.2 以不同的成長溫度成長氮化鎵薄膜 ............................................. 35
4.1.3 以不同的氨氣流量成長氮化鎵薄膜 ............................................. 36
4.2 單層薄膜之形貌與鑑定 ........................................................................ 37
4.2.1 超奈米晶鑽石.................................................................................. 37
4.2.2 在超奈米晶鑽石中加入氫氣 ......................................................... 38
4.3 鑽石雙層薄膜之形貌與鑑定 ................................................................ 39
4.4 利用穿透式電子顯微鏡分析雙層鑽石薄膜 ........................................ 41
4.4.1 利用穿透式電子顯微鏡分析雙層鑽石薄膜橫截面 ..................... 41
VII
4.4.2 利用穿透式電子顯微鏡分析雙層鑽石薄膜組成 ......................... 42
第五章、結論 ......................................................................................................... 71
參考文獻 .................................................................................................................

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