|
[1] H. Holleck, Material selection for hard coatings, J. Vac. Sci. Technol. A., 4 (1986) 2661-2669. [2] Z.P. Huang, Y. Sun, T. Bell, Friction behaviour of TiN, CrN and (TiAl)N coatings, Wear, 173 (1994) 13-20. [3] H.A. Jehn, Improvement of the corrosion resistance of PVD hard coating–substrate systems, Surf. Coat. Technol., 125 (2000) 212-217. [4] P.C. Johnson, H. Randhawa, Zirconium nitride films prepared by cathodic arc plasma deposition process, Surf. Coat. Technol., 33 (1987) 53-62. [5] P. Panjan, B. Navinšek, A. Žabkar, V. Marinković, D. Mandrino, J. Fišer, Structural analysis of ZrN and TiN films prepared by reactive plasma beam deposition, Thin Solid Films, 228 (1993) 233-237. [6] D. Jianxin, L. Jianhua, Z. Jinlong, S. Wenlong, N. Ming, Friction and wear behaviors of the PVD ZrN coated carbide in sliding wear tests and in machining processes, Wear, 264 (2008) 298-307. [7] U.K. Wiiala, I.M. Penttinen, A.S. Korhonen, J. Aromaa, E. Ristolainen, Improved corrosion resistance of physical vapour deposition coated TiN and ZrN, Surf. Coat. Technol., 41 (1990) 191-204. [8] L. van Leaven, M.N. Alias, R. Brown, Corrosion behavior of ion plated and implated films, Surf. Coat. Technol., 53 (1992) 25-34. [9] L.E. Toth, Transition Metal Carbides and Nitrides, Refractory Materials, Academic Press, New York, 1971. [10] S. Horita, M. Kobayashi, H. Akahori, T. Hata, Material properties of ZrN film on silicon prepared by low-energy ion-assisted deposition, Surf. Coat. Technol., 66 (1994) 318-322. [11] B.-H. Moon, H.-C. Choe, W.A. Brantley, Surface characteristics of TiN/ZrN coated nanotubular structure on the Ti–35Ta–xHf alloy for bio-implant applications, Appl. Surf. Sci., 258 (2012) 2088-2092. [12] C. A. Carrasco, V. Vergara S, R. Benavente G, N. Mingolo, J.C. Rı´os, The relationship between residual stress and process parameters in TiN coatings on copper alloy substrates, Mater. Charact., 48 (2002) 81-88. [13] A.E. Reiter, V.H. Derflinger, B. Hanselmann, T. Bachmann, B. Sartory, Investigation of the properties of Al1−xCrxN coatings prepared by cathodic arc evaporation, Surf. Coat. Technol., 200 (2005) 2114-2122. [14] S. Boelens, H. Veltrop, Hard coatings of TiN, (TiHf)N and (TiNb)N deposited by random and steered arc evaporation, Surf. Coat. Technol., 33 (1987) 63-71. [15] J. Romero, M.A. Gómez, J. Esteve, F. Montalà, L. Carreras, M. Grifol, A. Lousa, CrAlN coatings deposited by cathodic arc evaporation at different substrate bias, Thin Solid Films, 515 (2006) 113-117. [16] J. Vyskočil, J. Musil, Cathodic arc evaporation in thin film technology, J. Vac. Sci. Technol. A., 10 (1992) 1740-1748. [17] M. Odén, C. Ericsson, G. Håkansson, H. Ljungcrantz, Microstructure and mechanical behavior of arc-evaporated Cr–N coatings, Surf. Coat. Technol., 114 (1999) 39-51. [18] P.J. Kelly, R.D. Arnell, Magnetron sputtering: a review of recent developments and applications, Vacuum, 56 (2000) 159-172. [19] J. Musil, V. Valvoda, S. Kadlec, J. Vyskocil, IPAT 87: Proceeds of the 6th International Conference on Ion and Plasma Assisted Techniques, Brighton UK, DOI (1987) 184-189. [20] T. Larsson, H.O. Blom, C. Nender, S. Berg, A physical model for eliminating instabilities in reactive sputtering, J. Vac. Sci. Technol. A., 6 (1988) 1832-1836. [21] J. Musil, P. Baroch, J. Vlček, K.H. Nam, J.G. Han, Reactive magnetron sputtering of thin films: present status and trends, Thin Solid Films, 475 (2005) 208-218. [22] A. Rizk, S.B. Youssef, S.K. Habib, Glow discharge characteristics when magnetron sputtering copper in different plasma atmospheres operated at low input power, Vacuum, 38 (1988) 93-95. [23] S. Schiller, U. Heisig, K. Steinfelder, J. Strumpfel, W. Sieber, Reactive DC high-rate sputtering with the magnetron-plasmatron for industrial applications, Vakuum-Tech., 30 (1981) 3-14. [24] J.L. Vossen, S. Krommenhoek, V.A. Koss, Some experiments that provide direct visualization of reactive sputtering phenomena, J. Vac. Sci. Technol. A., 9 (1991) 600-603. [25] I. Safi, Recent aspects concerning DC reactive magnetron sputtering of thin films: a review, Surf. Coat. Technol., 127 (2000) 203-218. [26] L. Combadiere, J. Machet, Study and control of both target-poisoning mechanisms and reactive phenomenon in reactive planar magnetron cathodic sputtering of TiN, Surf. Coat. Technol., 82 (1996) 145-157. [27] K. Koski, J. Hölsä, P. Juliet, Surface defects and arc generation in reactive magnetron sputtering of aluminium oxide thin films, Surf. Coat. Technol., 115 (1999) 163-171. [28] J. Deng, J. Liu, J. Zhao, W. Song, Wear mechanisms of PVD ZrN coated tools in machining, Int. J. Refract. Met. H., 26 (2008) 164-172. [29] M.B. Takeyama, A. Noya, K. Sakanishi, Diffusion barrier properties of ZrN films in the Cu/Si contact systems, J. Vac. Sci. Technol. B., 18 (2000) 1333-1337. [30] E. Budke, J. Krempel-Hesse, H. Maidhof, H. Schüssler, Decorative hard coatings with improved corrosion resistance, Surf. Coat. Technol., 112 (1999) 108-113. [31] Z. Wokulski, Mechanical Properties of TiN Whiskers, Phys. Status Solidi A, 120 (1990) 175-184. [32] J.E. Sundgren, Structure and properties of TiN coatings, Thin Solid Films, 128 (1985) 21-44. [33] W.-J. Chou, G.-P. Yu, J.-H. Huang, Deposition of TiN thin films on Si(100) by HCD ion plating, Surf. Coat. Technol., 140 (2001) 206-214. [34] JCPDS PDF#650961, DOI. [35] J. E. Hove, W. C. Riley, Modern Ceramic: Some Principles and Concepts, John Wiley, New York, 1965. [36] J.-H. Huang, K.-W. Lau, G.-P. Yu, Effect of nitrogen flow rate on structure and properties of nanocrystalline TiN thin films produced by unbalanced magnetron sputtering, Surf. Coat. Technol., 191 (2005) 17-24. [37] E. Török, A.J. Perry, L. Chollet, W.D. Sproul, Young's modulus of TiN, TiC, ZrN and HfN, Thin Solid Films, 153 (1987) 37-43. [38] A.J. Perry, V. Valvoda, D. Rafaja, X-ray residual stress measurement in TiN, ZrN and HfN films using the Seemann-Bohlin method, Thin Solid Films, 214 (1992) 169-174. [39] A.J. Perry, A contribution to the study of poisson's ratios and elasticconstants of TiN, ZrN and HfN, Thin Solid Films, 193–194, Part 1 (1990) 463-471. [40] J. Ping, M. Shigeo, Evaluation of Internal Stress in Reactively Sputter-Deposited ZrN Thin Films, Jpn. J. Appl. Phys., 30 (1991) 1463. [41] H. Okamoto, N-Zr (Nitrogen-Zirconium), JPED, 27 (2006) 551-551. [42] M. Del Re, R. Gouttebaron, J.P. Dauchot, P. Leclère, G. Terwagne, M. Hecq, Study of ZrN layers deposited by reactive magnetron sputtering, Surf. Coat. Technol., 174-175 (2003) 240-245. [43] D. Pilloud, A.S. Dehlinger, J.F. Pierson, A. Roman, L. Pichon, Reactively sputtered zirconium nitride coatings: structural, mechanical, optical and electrical characteristics, Surf. Coat. Technol., 174–175 (2003) 338-344. [44] C.-P. Liu, H.-G. Yang, Deposition temperature and thickness effects on the characteristics of dc-sputtered ZrNx films, Mater. Chem. Phys., 86 (2004) 370-374. [45] W.D. Sproul, P.J. Rudnik, C.A. Gogol, The effect of target power on the nitrogen partial pressure level and hardness of reactively sputtered titanium nitride coatings, Thin Solid Films, 171 (1989) 171-181. [46] C.-I. Chiu, Effect of processing parameters on wear resistance and mechanical properties of thick TiN coatings on D2 steel deposited by unbalanced magnetron sputtering, Department of Engineering and System Science, National Tsing Hua University, Hsinchu, Taiwan, 2014. [47] J. Gu, G. Barber, S. Tung, R.-J. Gu, Tool life and wear mechanism of uncoated and coated milling inserts, Wear, 225–229, Part 1 (1999) 273-284. [48] J. Deng, J. Liu, Z. Ding, M. Niu, Unlubricated friction and wear behaviors of ZrN coatings against hardened steel, Mater. Design, 29 (2008) 1828-1834. [49] J.M. Molarius, A.S. Korhonen, E. Harju, R. Lappalainen, Comparison of cutting performance of ion-plated NbN, ZrN, TiN and (Ti, Al)N coatings, Surf. Coat. Technol., 33 (1987) 117-132. [50] E. Gariboldi, Drilling a magnesium alloy using PVD coated twist drills, J. Mater. Process. Tech., 134 (2003) 287-295. [51] S.J. Bull, E.G. Berasetegui, An overview of the potential of quantitative coating adhesion measurement by scratch testing, Tribol. Int., 39 (2006) 99-114. [52] P.J. Burnett, D.S. Rickerby, The relationship between hardness and scratch adhession, Thin Solid Films, 154 (1987) 403-416. [53] J. Valli, U. Mäkelä, A. Matthews, V. Murawa, TiN coating adhesion studies using the scratch test method, J. Vac. Sci. Technol. A., 3 (1985) 2411-2414. [54] P. Hedenqvist, M. Olsson, S. Jacobson, S. Söderberg, Failure mode analysis of TiN-coated high speed steel: In situ scratch adhesion testing in the scanning electron microscope, Surf. Coat. Technol., 41 (1990) 31-49. [55] P.A. Steinmann, Y. Tardy, H.E. Hintermann, Adhesion testing by the scratch test method: The influence of intrinsic and extrinsic parameters on the critical load, Thin Solid Films, 154 (1987) 333-349. [56] J. Takadoum, H.H. Bennani, Influence of substrate roughness and coating thickness on adhesion, friction and wear TiN films, Surf. Coat. Technol., 96 (1997) 272. [57] D. Valerini, M.A. Signore, L. Tapfer, E. Piscopiello, U. Galietti, A. Rizzo, Adhesion and wear of ZrN films sputtered on tungsten carbide substrates, Thin Solid Films, 538 (2013) 42-47. [58] T. Polcar, N.M.G. Parreira, R. Novák, Friction and wear behaviour of CrN coating at temperatures up to 500 °C, Surf. Coat. Technol., 201 (2007) 5228-5235. [59] S. Wilson, A.T. Alpas, Effect of temperature and sliding velocity on TiN coating wear, Surf. Coat. Technol., 94–95 (1997) 53-59. [60] S. Wilson, A.T. Alpas, TiN coating wear mechanisms in dry sliding contact against high speed steel, Surf. Coat. Technol., 108–109 (1998) 369-376. [61] S. Wilson, A.T. Alpas, Wear mechanism maps for TiN-coated high speed steel, Surf. Coat. Technol., 120–121 (1999) 519-527. [62] T. Polcar, N.M.G. Parreira, A. Cavaleiro, Tribological characterization of tungsten nitride coatings deposited by reactive magnetron sputtering, Wear, 262 (2007) 655-665. [63] D.A. Shirley, High-Resolution X-Ray Photoemission Spectrum of the Valence Bands of Gold, Phys. Rev. B., 5 (1972) 4709-4714. [64] M. Matsuoka, S. Isotani, W. Sucasaire, N. Kuratani, K. Ogata, X-ray photoelectron spectroscopy analysis of zirconium nitride-like films prepared on Si(100) substrates by ion beam assisted deposition, Surf. Coat. Technol., 202 (2008) 3129-3135. [65] I. Milošev, H.H. Strehblow, M. Gaberšček, B. Navinšek, Electrochemical Oxidation of ZrN Hard (PVD) Coatings Studied by XPS, Surf. Interface Anal., 24 (1996) 448-458. [66] C. Morant, J.M. Sanz, L. Galán, L. Soriano, F. Rueda, An XPS study of the interaction of oxygen with zirconium, Surf. Sci., 218 (1989) 331-345. [67] P. Scherrer, Gött. Nachr., 2 (1918) 98. [68] L.V. Azároff, M.J. Buerger, The powder method in X-ray crystallography, McGraw-Hill, New York, 1958. [69] W.C. Oliver, G.M. Pharr, An improved technique for determining hardness and elastic modulus using load and displacement sensing indentation experiments, J. Mater. Res., 7 (1992) 1564-1583. [70] C.H. Ma, J.H. Huang, H. Chen, Residual stress measurement in textured thin film by grazing-incidence X-ray diffraction, Thin Solid Films, 418 (2002) 73-78. [71] B.B. He, Two-Dimensional X-Ray Diffraction, John Wiley & Sons, Inc., New Jersey, 2009, pp. 85-132. [72] C.L. Azanza Ricardo, M. D'Incau, P. Scardi, Revision and extension of the standard laboratory technique for X-ray diffraction measurement of residual stress gradients, J. Appl. Crystallogr, 40 (2007) 675-683. [73] J. Kõo, J. Valgur, Layer growing/removing method for the determination of residual stresses in thin inhomogeneous discs, Materials science forum, Trans Tech Publ, 2000, pp. 89-94. [74] I. Kraus, G. Gosmanová, On X-ray measurements of residual stresses in materials with lattice strain gradient, Czech. J. Phys., 39 (1989) 751-756. [75] V. Hauk, B. Krüger, A new approach to evaluate steep stress gradients principally using layer removal, Materials science forum, Trans Tech Publ, 2000, pp. 80-82. [76] H.K. Tönshoff, J. Plöger, H. Seegers, Determination of residual stress gradients in brittle materials using an improved spline algorithm, Materials science forum, Trans Tech Publ, 2000, pp. 83-88. [77] A.J. Perry, J.A. Sue, P.J. Martin, Practical measurement of the residual stress in coatings, Surf. Coat. Technol., 81 (1996) 17-28. [78] S. Zhang, D. Sun, Y. Fu, H. Du, Effect of sputtering target power on microstructure and mechanical properties of nanocomposite nc-TiN/a-SiNx thin films, Thin Solid Films, 447–448 (2004) 462-467. [79] ASTM standards, Section 3, 1996, B117, p.4, and G85, 0.350. [80] JCPDS pdf #350753, DOI. [81] W.-J. Chou, G.-P. Yu, J.-H. Huang, Bias effect of ion-plated zirconium nitride film on Si(100), Thin Solid Films, 405 (2002) 162-169. [82] J.H. Huang, C.Y. Hsu, S.S. Chen, G.P. Yu, Effect of substrate bias on the structure and properties of ion-plated ZrN on Si and stainless steel substrates, Mater. Chem. Phys., 77 (2003) 14-21. [83] J.-H. Huang, H.-C. Yang, X.-J. Guo, G.-P. Yu, Effect of film thickness on the structure and properties of nanocrystalline ZrN thin films produced by ion plating, Surf. Coat. Technol., 195 (2005) 204-213. [84] J.-H. Huang, C.-H. Ho, G.-P. Yu, Effect of nitrogen flow rate on the structure and mechanical properties of ZrN thin films on Si (100) and stainless steel substrates, Mater. Chem. Phys., 102 (2007) 31-38. [85] http://henke.lbl.gov/optical_constants/atten2.html. [86] http://webbook.nist.gov/cgi/cbook.cgi?Name=ZrN&Units=SI&cTC=on#Refs. [87] http://webbook.nist.gov/cgi/cbook.cgi?Name=Titanium+nitride&Units=SI&cTC=on. [88] A. Ruden, J.M. Gonzalez, J.S. Restrepo, M.F. Cano, F. Sequeda, Tribology of ZrN, CrN and TiAlN thin films deposited by reactive magnetron sputtering, Dyna, 80 (2013) 95-100.
|