20世紀末以來，隨著奈米科技的蓬勃發展，各種奈米結構的製程也相繼被發明，如黃光微影、奈米壓印、電子束微影和雷射干涉微影……等等。其中雷射干涉微影(Laser Interference Lithography)係將兩道或多道同調雷射光互相干涉，再利用光敏感層紀錄干涉條紋，並顯影後形成奈米結構。其優點為不需光罩、不需複雜昂貴的光學設備、可一次大面積曝光……等等，在需要週期性奈米結構的領域如發光二極體(LED)、一維光柵、光子晶體，因為成本低廉，產能很高，可說是前途無可限量。
然而，雷射干涉微影因其原理的關係，曝光結果對於光形非常敏感，尤其是在大面積曝光時，光形的細微變化就可能造成曝光結果有缺陷，進而影響到後續的製程和應用。本實驗室已開發了兩吋的雷射干涉微影自動曝光系統，但在實驗中發現，系統會因受到外界干擾，影響光形及曝光結果，並且還要花費人力和時間重新調整光路。是故，本研究將找出造成曝光結果缺陷的真正原因，並設計一即時光形監測系統，來監控雷射干涉微影系統的光形，當光形因外界干擾而產生變化時，光形監測系統將發現並立即停止系統進行曝光，待系統校正後，再重新進行曝光。

中文摘要 I
Abstract II
致謝 III
目錄 V
圖目錄 VII
第一章 緒論 1
1.1 奈米科技發展 1
1.2 雷射干涉微影 3
1.3 研究動機與目標 10
第二章 研究方法 12
2.1 空間濾波器造成光形變化 12
2.1.1 繞射原理與數學模型建構 12
2.1.2 曝光測試觀察 16
2.2 模態跳換(mode hopping) 18
2.2.1 模態跳換造成曝光缺陷 18
2.2.2 模擬模態跳換 20
2.2.3 實際測量模態跳換 21
2.2.4 雷射溫度及入射電流監控 22
2.3 光形監測系統架設 22
2.3.1 確認感光元件敏感度 23
2.3.2 監控系統設計與架構 24
2.4 建構光形能量分布資料庫 26
2.5 用光形監控系統觀察模態跳換 27
第三章 實驗結果 29
3.1 電腦模擬結果 29
3.2 曝光測試觀察 34
3.3 電腦模擬模態跳換 37
3.4 實際測量模態跳換 40
3.5 監測雷射溫度及入射電流 42
3.6 光形監測系統量測模態跳換 43
第四章 結論與未來規劃 47
4.1 結論 47
4.2 未來規劃 48
4.2.1 模態跳換監測系統 48
4.2.2 自動控制系統 49
第五章 參考文獻 51

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