摘要
本研究以噴塗熱裂解法(Spray Pyrolysis Method)來製備非晶氧化銦鎵鋅(In-Ga-Zn-O, IGZO)氧化物薄膜，此鍍膜技術設備簡單，可在非真空環境下沉積薄膜。不過非真空環境之下薄膜成分控制穩定相當困難，特別是在製備多元金屬氧化物混合薄膜。本研究就薄膜成分穩定做探討，主要分兩部分。首先藉由鍍膜之前前驅物金屬鹽類的選擇、前驅物溶液pH值做研究，探討IGZO噴塗熱裂解法中前驅物裂解成膜的機制。另一部分透過對IGZO薄膜做特性分析，以XRD繞射圖驗證其為非晶態，XPS確認化學鍵結與元素成分，進一步驗證以噴霧熱裂解法製備IGZO薄膜符合要求。最後透過各元素各自成膜能力不同做探討，從活化能和各自元素鍍率的不同切入，並將結果推想到IGZO混合薄膜上，解釋混合薄膜中各元素含量不均原因。
本研究從前驅物的特性，前驅物溶液中解離反應，製程時載氣、基板溫度對鍍率的改善，前驅物濃度對成膜後元素含量的影響等實驗時會碰到的參數作探討。期望做為未來欲以噴塗熱裂解法鍍多元混合薄膜時選擇適當前驅物和設計鍍膜參數的參考。

摘要 i
Abstract ii
誌謝 iii
目錄 v
表目錄 vii
圖目錄 viii
第一章 緒論 1
1.1 前言 1
1.2 透明導電薄膜 (Transparent Conductive Thin Film) 2
1.2.1 金屬薄膜 2
1.2.2 金屬氧化物薄膜 2
1.3 研究動機 4
第二章 文獻回顧 6
2.1 薄膜電晶體液晶顯示器 6
2.1.1 TFT-LCD材料選擇 6
2.1.2 非晶氧化物載子傳導機制 8
2.1.3 IGZO材料介紹 9
2.2 薄膜製備方式 12
2.2.1 磁控濺鍍法 (Magnetron Sputtering) 13
2.2.2 脈衝雷射沉積 (Pulsed Laser Deposition) 14
2.2.3 電漿輔助化學氣相沉積 (Plasma Enhanced Chemical Vapor Deposition) 14
2.2.4 溶膠凝膠法 (Sol Gel) 14
2.2.5 噴塗熱裂解法 (Spray Pyrolysis) 15
2.2.5.1 噴塗熱裂解法模型 15
2.2.5.2 超音波霧化原理 18
2.2.5.3 逆壓電效應 19
2.3 前驅物材料選擇 19
2.3.1 螯合作用 (Chelation) 22
第三章 實驗流程與分析儀器 23
3.1 藥品與基板 23
3.1.1 實驗藥品 23
3.1.2 製程基板 24
3.2實驗流程 25
3.3實驗分析儀器 30
3.3.1 場發射掃描式電子顯微鏡 (FEG-SEM) 30
3.3.2 穿透式電子顯微鏡 (Transmission Electron Microscopy, TEM) 32
3.3.3 能量散射光譜儀 (Energy Dispersive Spectroscopy, EDS) 33
3.3.4 薄膜厚度分析儀 (N&K Analyzer) 33
3.3.5 X光光電子能譜儀 (X-ray Photoelectron Spectrometer, XPS） 33
3.3.6 X光繞射分析儀 (X-ray Diffraction, XRD) 35
3.3.7 霍爾量測儀 (Hall Measurement) 36
3.3.8 熱重量分析儀 ( Thermogravimetric Analyzer, TGA) 38
第四章 實驗結果與討論 39
4.1 前驅物熱裂解溫度測定 39
4.2 前驅物漿料設計 42
4.2.1助溶劑、漿料pH值對成膜影響 42
4.2.2前驅物選擇 45
4.2.3 前驅物漿料設計結論 46
4.3 IGZO薄膜特性探討 47
4.3.1 IGZO薄膜結晶性分析 47
4.3.2 IGZO薄膜化學鍵結分析 49
4.3.3 IGZO薄膜表面形貌與微結構分析 52
4.3.4 IGZO薄膜成分分析 55
4.4 單元氧化物成膜能力探討 59
4.5 不同載氣、不同基板溫度對鍍膜速率影響 62
4.6 不同前驅物濃度對薄膜成分含量影響 65
第五章 結論 69
參考文獻 71

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