本研究實驗利用微米（5 um）及次微米（0.5 um）圖形尺寸的模具對共軛高分子MEH-PPV及P3HT進行壓印，使模具上之圖形複印於共軛高分子膜面上。研究分為幾個方向，首先觀察分析壓印後高分子膜的形變情形，之後分別探討共軛高分子受到不同模具尺寸及模具形狀壓印後的形變、共軛高分子的濃度效應、原始薄膜厚度、壓印時的溫度、基材效應及壓印時間與壓印應力大小對共軛高分子光致發光(PL)的影響，最後再利用共軛高分子壓印之後應力釋放及共軛高分子結晶性來解釋壓印的結果。

The experiment of this study uses the mold with microns (5 um) and sub-micron (0.5 um) pattern-size to imprint on the conjugated polymer, MEH-PPV and P3HT, and the mold of patterns will reproduce onto the film surface of the conjugated polymer. There are several aspects in this study. First, we observe the deformation situation of the imprinted polymer film. And then, we discuss the factors that influence on Photoluminescence (PL) of conjugated polymer after imprinting which caused by the mold size and shape, concentration of the conjugated polymer, initial film thickness, temperature during imprinting, substrate effect, imprinting time and the strength of stress, respectively. Finally, we try to explain the result of the imprinting data by stress relaxation after imprinting and the crystallization of conjugated polymer.

摘要 I
Abstract II
致謝 III
目錄 V
圖目錄 VIII
表目錄 XIX
第一章 簡介 1
第二章 文獻回顧 2
2-1 共軛高分子簡介 2
2-1-1 共軛高分子之發光特性 3
2-1-2 共軛高分子的受光激發行為 6
2-1-3 共軛高分子之稀釋效應 7
2-2 共軛高分子受應力的影響 8
2-2-1 應力對交纏密度(Entanglement density)的影響 8
2-2-2 應力對共軛高分子鏈段的作用 11
2-3 利用FEM模擬分析壓印高分子的應力分佈 13
第三章 實驗方法 16
3-1 實驗材料 16
3-1-1 高分子材料 16
3-1-2 有機溶劑 17
3-1-3 實驗基材 18
3-2 實驗方法 18
3-2-1 模具製作 18
3-2-2 壓印樣品製備 23
3-3實驗儀器 27
3-3-1壓模機與加熱組件 27
3-3-2 光學顯微鏡 (Optical microscopy) 29
3-3-3 光致發光光譜儀 (Photoluminescence spectroscopy) 30
3-3-4 原子力顯微鏡 (Atomic force microscopy) 33
3-3-5 共軛焦螢光光譜儀系統 36
3-3-6 低掠角X光繞射(GIXRD) 37
第四章 結果與討論 40
4-1 共軛高分子之壓印 40
4-2 影響壓印共軛高分子膜光致發光效應的因素 43
4-2-1 模具尺寸效應 43
4-2-2 模具形狀效應 48
4-2-3 共軛高分子濃度效應 49
4-2-4 膜厚因素 56
4-2-5 熱壓印過程溫度的影響 59
4-2-6 基材效應 63
4-2-7 壓印深度的影響 69
4-3 應力釋放 76
4-3-1 脫模後經過長時間的應力釋放 76
4-3-2 脫模前後的應力釋放 77
4-4高分子結晶性對壓印的影響 103
第五章 結論 108
第六章 參考文獻 110

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