BWR許多材料組件均為304和304L不鏽鋼，長期運轉下容易發生沿晶應力腐蝕龜裂(Intergranular Stress Corrosion Cracking, IGSCC)的問題。目前世界均採用加氫水化學(Hydrogen Water Chemistry, HWC)和貴重金屬添加(Noble Metal Chemical Addition, NMCA)技術，來防制IGSCC的發生。但這些方法有副作用，因此近年抑制性被覆(Inhibitive Protective Coatings, IPC)逐漸發展。
根據文獻，利用熱水沉積法被覆氧化鋯和氧化鈦在304不鏽鋼的防蝕效果已被證實。本實驗的主要目的，就是要測試氧化鋯和氧化鈦被覆層在304和304L不鏽鋼上的耐久度。測試的方法，是將試片放置在除氧、濃度為2 mM K3Fe(CN)6 與K4Fe(CN)6混合溶液中，進行高流速沖刷4周，以電化學方法測試被覆層是否會剝落。結果顯示，被覆過後試片的腐蝕速度較未被覆慢，證明被覆層抑制金屬腐蝕效益。且經過長期高流速耐久度的沖刷測試，被覆試片的電化學性質均沒有明顯改變，由此可見抑制性被覆層在304與304L不鏽鋼上，有四周的耐久度。

摘要 i
Abstract ii
致謝 iii
目錄 v
圖目錄 xi
表目錄 xxi
第一章 前言 1
1.1 研究背景 1
1.2 研究目的 4
1.3 論文結構 5
第二章 文獻回顧 6
2.1 應力腐蝕龜裂 6
2.1.1 應力腐蝕龜裂肇因 7
2.1.2 應力腐蝕龜裂機制 8
2.1.3 SCC破裂特徵 12
2.1.4 防治方法 12
2.2 不鏽鋼組件在高溫形成氧化膜的特性 16
2.2.1 高溫純水中不鏽鋼表面氧化層結構 16
2.2.2 拉曼散射光譜分析 23
2.3 電化學參數介紹 24
2.3.1 混合電位模式 (Mixed Potential Model, MPM) 24
2.3.2 影響ECP大小的重要參數 27
2.3.3電化學腐蝕電位與應力腐蝕龜裂關係 28
2.3.4 伊凡斯圖 (Evan’s Diagram) 29
2.3.5 電化學阻抗頻譜 30
2.4 加氫水化學(HWC)與貴重金屬添加(NMCA)特性 32
2.4.1 加氫水化學 32
2.4.2 貴重金屬添加 33
2.5 氧化鋯抑制性被覆(ZrO2 Coating) 35
2.5.1 抑制性覆膜機制 35
2.5.2 伊凡斯圖 (Evans Diagram) 38
2.5.3 溶膠凝膠法(Sol-gel) 41
2.5.4 電漿噴灑法(Plasma Spray) 42
2.5.5 化學添加法(Chemical Addition) 43
2.5.6 熱水沉積法(Hydrothermal Deposition) 46
2.5.7 氧化鋯光觸媒防蝕應用技術 51
2.6 氧化鈦抑制性被覆(TiO2 Coating) 53
2.6.1 溶膠凝膠法(Sol-gel) 53
2.6.2 噴霧熱解法(Spray Pyrolysis) 55
2.6.3 電漿噴灑法(Plasma Spray) 57
2.6.4 化學添加注射法(Chemical Injection Method) 58
2.6.5 原子層沉積技術(Atomic Layer Deposition) 60
2.6.6 熱水沉積法(Hydrothermal Deposition) 62
2.7 高流速的影響 65
2.7.1高流速對電化學腐蝕電位的影響 65
2.7.2高流速對應力腐蝕龜裂的影響 67
2.7.3高流速對抑制性被覆膜的影響 70
第三章 研究方法 73
3.1實驗方法與流程 73
3.2試片準備 75
3.3 敏化程度測試 75
3.4 預長氧化膜 77
3.5 抑制性被覆 77
3.6 實驗設備 78
3.6.1 模擬BWR水循環系統 78
3.6.2抑制性被覆系統 80
3.6.3 參考電極製作 81
3.6.4 常溫高流速系統 82
3.6.5 照光裝置 83
3.7 表面分析 86
3.7.1 基材元素成分定量分析 86
3.7.2 SEM表面微結構分析與EDX成分分析 86
3.7.3 TEM試片橫截面(Cross Section)分析與EDX成分分析 87
3.7.4 拉曼光譜儀(Raman Spectroscopy) 87
3.7.5 感應式耦合電漿質譜分析(ICP-MS) 88
3.8 高溫電化學分析 89
3.9 常溫電化學分析 91
3.9.1 常溫高流速耐久度動態電位極化掃描 91
3.9.2 常溫不同流速動態電位極化掃描 92
3.9.3 常溫照光動態電位極化掃描 92
3.9.4 常溫電化學交流阻抗分析 93
3.10 動態極化掃描分析方法 94
第四章 實驗結果 97
4.1敏化測試 97
4.2 預長氧化膜結果分析 98
4.2.1 掃描式電子顯微鏡 (SEM) 98
4.2.2 雷射拉曼散射光譜 (LRS) 102
4.3 氧化鋯被覆試片表面分分析 105
4.3.1 掃瞄式電子顯微鏡 (SEM) 105
4.3.2 雷射拉曼散射光譜 (LRS) 108
4.3.3 感應耦合電漿質譜分析 (ICP-MS) 112
4.4 氧化鈦被覆試片表面分分析 113
4.4.1 掃瞄式電子顯微鏡 (SEM) 113
4.4.2 雷射拉曼散射光譜 (LRS) 117
4.4.3 感應耦合電漿質譜分析 (ICP-MS) 120
4.5 穿隧式電子顯微鏡(TEM)橫截面分析 121
4.5.1 氧化鈦抑制性被覆橫截面分析 121
4.5.2 氧化鋯抑制性被覆橫截面分析 125
4.6 高溫動態電位極化掃描 126
4.7 常溫高流速動態電位極化掃描 128
4.7.1 304不鏽鋼氧化鋯被覆層耐久度極化曲線 129
4.7.2 304L不鏽鋼氧化鋯被覆層耐久度極化曲線 137
4.7.3 304不鏽鋼氧化鈦被覆層耐久度極化曲線 145
4.7.4 304L不鏽鋼氧化鈦被覆層耐久度極化曲線 154
4.8常溫不同流速動態電位極化掃描 162
4.8.1 304不鏽鋼未被覆與被覆試片極化曲線 162
4.8.2 304L不鏽鋼未被覆與被覆試片極化曲線 165
4.9 常溫照光動態電位極化掃描 167
4.9.1照射UV光極化曲線 167
4.9.2照射Γ-ray極化曲線 171
4.10 常溫電化學阻抗分析 174
第五章 結論 176
第六章 未來工作 178
參考文獻 179

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