近年來，奈米雷射引起了廣泛的關注，因為相對於傳統雷射，他能夠突破繞射極限的基本物理限制。奈米雷射具有更快，更高效率的傳輸信號的優勢。奈米雷射技術的突破為積體電路整合提供了巨大的潛力，進一步增强了其應用前景。
在本實驗中，利用硫化鎘和石墨烯-絕緣層-金屬 (GIM) 组成的奈米雷射系統來激發表面電漿子-電磁極化子 (SPP) ，以達到光增強的效果。其中，硫化鎘因為低成本與方便合成的特性被選為半導體增益媒介材料，將分子束磊晶沉積的單晶鋁基板當成金屬層，並且在奈米線和氧化鋁絕緣層之間加入一層由化學氣相沉積製備的石墨烯，最後形成奈米雷射元件。
在添加石墨烯後，雷射閾值有著相當顯著的下降。結果顯示當加入一點七奈米的石墨烯後，可以得到最低的雷射閾值 (4.8 kW/cm2) ，相對於沒有添加石墨烯的系統，下降了百分之六十八。除此之外，不同厚度的石墨烯之雷射表現也在本次研究中有所討論。

Nanolasers have garnered significant interest in recent years due to their ability to overcome the diffraction limit compared to that of traditional lasers. They offer the advantage of transmitting signals in a faster and more efficient manner. The breakthroughs achieved in nanolaser technology hold great promise for integration with IC circuits, further enhancing their potential.
In the present research, we demonstrate a surface plasmon polariton (SPP) nanolaser consisting of CdS nanowires coupled with a single-crystalline aluminum (Al) film and alumina as an insulating interlayer. We then insert a graphene layer prepared by chemical vapor deposition between the nanowires and the insulating layer as a buffer layer. Finally, we create a graphene-insulating layer-metal (GIM) structured SPP laser.
The threshold value for lasing is considerably lower than the addition of other dielectric layer. We examine how varying the thickness of the graphene layer affects the performance of nanolasers. The results indicate that the inclusion of a 1.7 nm graphene layer has the lowest (4.8 kW/cm2) threshold value, which reduces the threshold value for lasing by as much as 68% compared to that without the insertion of graphene layer .The GIM structure promises to be applicable as electrical control or electrical injection of plasmonic devices.

Abstract I
摘要 II
致謝 III
Chapter 1 Introduction 1
1.1 Motivation 1
1.2 Nanotechnology 2
1.2.1 One-Dimensional Nanostructures 3
1.2.1.1 Vapor-Liquid-Solid (VLS) Growth Mechanism 4
1.2.2 Two Dimensional Nanostructures 6
1.3 Theoretical Background of Plasmonic Nanolaser 7
1.3.1 Surface Plasmon Polariton 7
1.3.2 Surface Plasmon Polariton in Nanolasers System 10
1.4 CdS on Hybrid Graphene-Insulator-Metal (GIM) Nanolaser Structure 12
1.4.1 CdS Nanowires 13
1.4.2 Hybrid GIM Structures 15
1.4.2.1 Graphene Buffer Layer 15
1.4.2.2 Insulating films 17
1.4.2.3 Aluminum Substate for Metal Layer 17
Chapter 2 Experimental Procedures 19
2.1 Synthesis of CdS Nanowires 19
2.1.1 Preparation of Substrate 19
2.1.2 Horizontal Tube Furnace Growth 20
2.2 Transfer of CVD-Grown Graphene Layer 21
2.3 Epitaxial Aluminum Film Growth by Molecular Beam Epitaxy 22
2.4 Fabrication of CdS Nanolaser device 23
2.5 Scanning Electron Microscope Observation 24
2.6 Transmission Electron Microscope Observation 25
2.7 X-Ray Diffractometer Measurement 27
2.8 Atomic Force Microscope Observation 28
2.9 Micro-Raman Spectroscopy 29
2.10 Focused Ion Beam (FIB) System 30
2.11 Spectroscopic Ellipsometry 31
2.12 Micro-Photoluminescence (μ-PL) Measurement 32
Chapter 3 Results and Discussion 33
3.1 Properties and Characteristics of CdS Nanowires 33
3.1.1 SEM observation 33
3.1.2 XRD Analysis 34
3.1.3 EDS Analysis 35
3.1.4 TEM Observation 36
3.1.5 PL Spectrum 37
3.2 Hybrid Graphene-Insulator-Metal Structure 38
3.2.1 CVD Transferred Graphene 38
3.2.2 Al2O3 Insulating Layer 41
3.2.3 Epitaxial Aluminum Film 43
3.3 Lasing characteristic of CdS / Al2O3 / Al structure 44
3.3.1 3 nm native oxide 44
3.3.2 5nm Al2O3 45
3.4 Effects of Different Thickness of Graphene on Lasing Performance 46
3.4.1 0.5 nm graphene 46
3.4.2 1.7 nm graphene 47
3.4.3 2.5 nm graphene 48
3.5 Comparison of Different CdS Lasing System 49
3.6 Comparison of Stability of Nanolasers with Three Kinds of Graphene 51
3.7 Simulation Results 53
3.8 Comparison of Lasing Performance with Other Relevant Work 55
Chapter 4 Summary and Conclusions 57
Chapter 5 Future Prospects 58
5.1 Plasmonic Nanolaser Based on Black Phosphorus Nanosheets 58
5.2 Fabrication of Plasmonic Nanolaser system with different shape cavity 59
Appendix………………………………………………………………..60
References………………………………………………………………63

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