近年來，包括電子工業在內的各項產業快速的發展，對材料的需求量及品質日漸提升，但在經歷長年大量的開採後自然資源已逐漸枯竭，導致原料的輸出逐漸下降且開採成本也隨之增加。在此背景下，純化(回收)技術的發展逐漸受到更大的關注，有鑑於傳統純化(回收)製程皆有各自的缺陷，難以符合現今市場的多元需求，通常需將多種技術整合使用才有較好的效益，但也使處理過程變得更複雜。在本研究中希望開發一種新穎的溶液電漿技術，達到低成本、高效率的一步製程，解決現有方法中高能耗或高化學消耗的困難並取而代之。
在此選擇以銅/銅合金作為研究材料，不僅市占率高需求量也逐漸增加，適合做為將新技術引進市場的切入點，且已在各領域被廣泛運用和研究，在豐富的背景知識下，更有利於排除新技術開發時遇到的困難。本研究分別以高純度銅和低純度黃銅為原料，分別模擬多雜質的初期回收和高純度的精煉情況，判斷此系統適合的純化區間。
在多元素的複雜系統下，利用水化學熱力學平衡模擬軟體輔助，預測不同參數條件下可能產生的化合物及穩定態，再進行實驗上的驗證和優化得出最佳的純化效果，主要藉由控制電解質種類、pH值和溫度等方式將其餘雜質元素去除，最終產物純度可達到99.99%以上。

Nowadays, the demand for high-quality materials keeps increasing. However, the natural resources have gradually been exhausted, resulting in a gradual decline in the output of raw materials and mining costs increase. In this context, the development of purification technology has gradually attracted greater attention. Traditional purification (recycling) processes have their shortcomings, it is difficult to meet the diverse needs of the current market. It is hoped to develop a novel solution plasma technology to achieve a low-cost, high-efficiency one-step process to solves and replaces the difficulties of high energy or high chemical consumption in existing methods.
Here, copper/copper alloy is chosen as the research material, which has a high market share and gradually increases in demand. It is suitable as an entry point for introducing new technologies into the market and has been widely used and researched in various fields. Under the knowledge, it is more conducive to eliminating the difficulties encountered in the development of new technologies. In this study, high-purity copper and low-purity brass were used as raw materials, respectively, to simulate the initial recovery of multiple impurities and the refining of high-purity, and to determine the suitable purification interval for this system.
Under the complex multi-element system, the water chemistry thermodynamic equilibrium is used to simulate the software to help predict the compounds and stable states that may be produced under different parameter conditions, and then carry out experimental verification and optimization to obtain the best purification effect. The remaining impurity elements are removed using electrolyte type, pH value, and temperature, and the purity of the final product can reach above 99.99%.

第1章 緒論 1
1.1 研究起源 1
1.2 傳統純化技術比較 2
1.3 研究動機 4
第2章 文獻回顧 5
2.1 溶液電漿原理及應用 5
2.1.1 溶液電漿原理 5
2.1.2 溶液電漿系統 7
2.1.3 電極表面反應機制 8
2.2 溶液電漿系統中的變項 12
2.2.1 pH值效應 12
2.2.2 陰離子效應 14
2.2.3 陽離子效應 16
2.2.4 電解質濃度效應 17
2.3 熱力學模擬 19
2.4 銅/銅合金純化(回收)需求及市場 20
2.5 傳統銅/銅合金純化(回收)製程比較 22
第3章 實驗與分析方法 25
3.1 實驗內容與流程(Experimental Details) 25
3.1.1 實驗架構(Structure) 25
3.1.2 參數設定(Parameters) 27
3.2 純銅/氧化銅粉末特性分析(Characterization) 28
3.2.1 表面形貌:掃描式電子顯微鏡(Scan Electron Microscopy, SEM) 28
3.2.2 成分分析:X射線能量散步分析儀(Energy-dispersive X-ray spectroscopy, EDS) 28
3.2.3 純度分析:感應耦合電漿質譜分析儀(Inductively Coupled Plasma-Mass Spectrometry, ICP-MS) 29
第4章 結果與討論 30
4.1 溶液電漿反應與陰極溶出機制(Solution plasma reaction and cathode dissolution mechanism) 30
4.1.1 陰極析出反應 (Cathode dissolution reaction) 30
4.1.2 工作電壓效應(Applied voltage effect) 34
4.2 純銅/氧化銅之製備與參數影響(Influence of Process Parameters) 36
4.2.1 電解質選擇(Electrolyte species) 36
4.2.2 溶液酸鹼度(pH value effect) 39
4.2.3 溶液溫度效應(Temperature effect) 45
4.3 技術比較 49
第5章 結論與未來展望 51
5.1 結論 51
5.2 未來展望 51
第6章 參考文獻 53

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