|
[1] A. Magnѐli, Structures of the ReO3-type with recurrent dislocations of atoms: 'homologous series' of molybdenum and tungsten oxides, Acta Crystallogr. 6 (1953) 495-500. [2] G. Gassner, P.H. Mayrhofer, K. Kutschej, C. Mitterer, M. Kathrein, A new low friction concept for high temperatures: lubricious oxide formation on sputtered VN coatings, Tribol. Lett. 17 (2004) 751-755. [3] H.L. Schick, Thermodynamics of certain refractory compounds, Academic Press, New York, 1966. [4] C.-K. Wu, J.-H. Huang, G.-P. Yu, Optimization of deposition processing of VN thin films using design of experiment and single-variable (nitrogen flow rate) methods, Mater. Chem. Phys. 224 (2019) 246-256. [5] J.-S. Chun, I. Petrov, J.E. Greene, Dense fully 111-textured TiN diffusion barriers: Enhanced lifetime through microstructure control during layer growth, J. Appl. Phys. 86 (1999) 3633-3641. [6] J.-E. Sundgren, Structure and properties of TiN coatings, Thin Solid Films 128 (1985) 21-44. [7] R. Hübler, Hardness and corrosion protection enhancement behaviour of surgical implant surfaces treated with ceramic thin films, Surf. Coat. Technol. 116 (1999) 1111-1115. [8] H. Okamoto, N-V (Nitrogen-Vanadium), J. Phase Equilib. 22 (2001) 362-362. [9] M.B. Takeyama, T. Itoi, K. Satoh, M. Sakagami, A. Nyoa, Application of thin nanocrystalline VN film as a high-performance diffusion barrier between Cu and SiO2, J. Vac. Sci. Technol. B 22 (2004) 2542-2547. [10] X.-P. Qu, M. Zhou, T. Chen, Q. Xie, G.-P. Ru, B.-Z. Li, Study of ultrathin vanadium nitride as diffusion barrier for copper interconnect, Microeletron. Eng. 83 (2006) 236-240. [11] Q. Sun, Z.-W. Fu, Vanadium nitride as a novel thin film anode material for rechargeable lithium batteries, Electrochim. Acta 54 (2008) 403-409. [12] X. Chu, S.A. Barnett, M.S. Wong, W.D. Sproul, Reactive magnetron sputter deposition of polycrystalline vanadium nitride films, J. Vac. Sci. Technol. A 14 (1996) 3124-3129. [13] U. Helmersson, S. Todorova, S.A. Barnett, J.-E. Sundgren, L.C. Markert, J.E. Greene, Growth of single-crystal TiN/VN strained-layer superlattices with extremely high mechanical hardness, J. Appl. Phys. 62 (1987) 481-484. [14] J.-H. Huang, L.-J. Wei, I-S. Ting, Evaluation of fracture toughness of VN hard coatings: Effect of preferred orientation, Mater. Chem. Phys. 275 (2022) 125253. [15] ICDD Kabekkodu, International Centre for Diffraction Data, 2003. PDF# 65-0437. [16] H.O. Pierson, Handbook of refractory carbides & nitrides: properties, characteristics, processing and applications, William Andrew, New Jersey, 1996. [17] Y. Qiu, S. Zhang, B. Li, J.-W. Lee, D. Zhao, Influence of Nitrogen Partial Pressure and Substrate Bias on the Mechanical Properties of VN Coatings, Procedia Eng. 36 (2012) 217-225. [18] A.B. Mei, R.B. Wilson, D. Li, D.G. Cahill, A. Rockett, J. Birch, L. Hultman, J.E. Greene, I. Petrov, Elastic constants, Poisson ratios, and the elastic anisotropy of VN (001), (011), and (111) epitaxial layers grown by reactive magnetron sputter deposition, J. Appl. Phys. 115 (2014) 214908. [19] A.-N. Wang, G.-P. Yu, J.-H. Huang, Fracture toughness measurement on TiN hard coatings using internal energy induced cracking, Surf. Coat. Technol. 239 (2014) 20-27. [20] H.-W. Hsiao, J.-H. Huang, G.-P. Yu, Effect of oxygen on fracture toughness of Zr(N,O) hard coatings, Surf. Coat. Technol. 304 (2016) 330-339. [21] G. Sangiovanni, L. Hultman, V. Chirita, Supertoughening in B1 transition metal nitride alloys by increased valence electron concentration, Acta Mater. 59 (2011) 2121-2134. [22] W.M. Haynes, D.R. Lide, T.J. Bruno, CRC Handbook of Chemistry and Physics, 95th ed, CRC Press, Boca Raton, 2014. [23] H. Guo, B. Li, J. Wang, W. Chen, Z. Zhang, W. Wang, J. Jia, Microstructures, mechanical and tribological properties of VN films deposited by PLD technique, RSC Adv. 6 (2016) 33403-33408. [24] H. Guo, C. Lu, Z. Zhang, B. Liang, J. Jia, Comparison of microstructures and properties of VN and VN/Ag nanocomposite films fabricated by pulsed laser deposition, Appl. Phys. A 124 (2018) 1-8. [25] Z. Cai, J. Pu, X. Lu, X. Jiang, L. Wang, Q. Xue, Improved tribological property of VN film with the design of pre-oxidized layer, Ceram. Int. 45 (2019) 6051-6057. [26] E. Liu, J. Zhang, S. Chen, S. Du, H. Du, H. Cai, L. Wang, High temperature negative wear behaviour of VN/Ag composites induced by expansive oxidation reaction, Ceram. Int. 47 (2021) 15901-15909. [27] N. Fateh, G.A. Fontalvo, G. Gassner, C. Mitterer, The beneficial effect of high-temperature oxidation on the tribological behaviour of V and VN coatings, Tribol. Lett. 28 (2007) 1-7. [28] N. Fateh, G.A. Fontalvo, G. Gassner, C. Mitterer, Influence of high-temperature oxide formation on the tribological behaviour of TiN and VN coatings, Wear 262 (2007) 1152-1158. [29] H.A. Wriedt, The OV (oxygen-vanadium) system, Bull. Alloy Phase Diagr. 10 (1989) 271-277. [30] Y. Ningyi, L. Jinhua, L. Chenglu, Valence reduction process from sol–gel V2O5 to VO2 thin films, Appl. Surf. Sci. 191 (2002) 176-180. [31] M.J. Rivera‐Chaverra, D. Escobar, R. Ospina, M. Arroyave‐Franco, J.J. Olaya, A. Pardo‐Trujillo, E. Restrepo‐Parra, Influence of interfacial density on tribological performance of VN/TiN multilayers, Suf. Interface Anal. 53 (2021) 946-955. [32] B. Subramanian, R. Ananthakumar, A. Kobayashi, M. Jayachandran, Surface modification of 316L stainless steel with magnetron sputtered TiN/VN nanoscale multilayers for bio implant applications, J. Mater. Sci.: Mater. Med. 23 (2012) 329-338. [33] B. Deng, Y. Tao, D. Guo, Effects of vanadium ion implantation on microstructure, mechanical and tribological properties of TiN coatings, Appl. Surf. Sci. 258 (2012) 9080-9086. [34] R. Franz, J. Neidhardt, B. Sartory, R. Kaindl, R. Tessadri, P. Polcik, V.H. Derflinger, C. Mitterer, High-temperature low-friction properties of vanadium-alloyed AlCrN coatings, Tribol. Lett. 23 (2006) 101-107. [35] K. Kutschej, P.H. Mayrhofer, M. Kathrein, P. Polcik, C. Mitterer, Influence of oxide phase formation on the tribological behaviour of Ti–Al–V–N coatings, Surf. Coat. Technol. 200 (2005) 1731-1737. [36] W. Wang, S. Zheng, J. Pu, Z. Cai, H. Wang, L. Wang, G. He, Microstructure, mechanical and tribological properties of Mo-V-N films by reactive magnetron sputtering, Surf. Coat. Technol. 387 (2020) 125532. [37] W. Heinke, A. Leyland, A. Matthews, G. Berg, C. Friedrich, E. Broszeit, Evaluation of PVD nitride coatings, using impact, scratch and Rockwell-C adhesion tests, Thin Solid Films 270 (1995) 431-438. [38] J. Takadoum, H.H. Bennani, Influence of substrate roughness and coating thickness on adhesion, friction and wear of TiN films, Surf. Coat. Technol. 96 (1997) 272-282. [39] G. Skordaris, K.D. Bouzakis, T. Kotsanis, P. Charalampous, E. Bouzakis, B. Breidenstein, B. Bergmann, B. Denkena, Effect of PVD film's residual stresses on their mechanical properties, brittleness, adhesion and cutting performance of coated tools, CIRP J. Manuf. Sci. Technol. 18 (2017) 145-151. [40] M.T. Laugier, An energy approach to the adhesion of coatings using the scratch test, Thin Solid Films 117 (1984) 243-249. [41] L.C. Agudelo-Morimitsu, J. De La Roche, A. Ruden, D. Escobar, E. Restrepo-Parra, Effect of substrate temperature on the mechanical and tribological properties of W/WC produced by DC magnetron sputtering, Ceram. Int. 40 (2014) 7037-7042. [42] D. Valerini, M.A. Signore, L. Tapfer, E. Piscopiello, U. Galietti, A. Rizzo, Adhesion and wear of ZrN films sputtered on tungsten carbide substrates, Thin Solid Films 538 (2013) 42-47. [43] A. Leyland, A. Matthews, On the significance of the H/E ratio in wear control: a nanocomposite coating approach to optimised tribological behaviour, Wear 246 (2000) 1-11. [44] T.Y. Tsui, G.M. Pharr, W.C. Oliver, C.S. Bhatia, R.L. White, S. Anders, A. Anders, I.G. Brown, Nanoindentation and nanoscratching of hard carbon coatings for magnetic disks, MRS Proc. 383 (1995) 447-452. [45] Y.-W. Lin, J.-H. Huang, W.-J. Cheng, G.-P. Yu, Effect of Ti interlayer on mechanical properties of TiZrN coatings on D2 steel, Surf. Coat. Technol. 350 (2018) 745-754. [46] M. Ohring, Materials science of thin films: deposition and structure, Academic Press, San Diego, 2002. [47] D. Lundin, K. Sarakinos, An introduction to thin film processing using high-power impulse magnetron sputtering, J. Mater. Res. 27 (2012) 780-792. [48] A.E. Ross, R. Sanginés, B. Treverrow, M.M.M. Bilek, D.R. McKenzie, Optimizing efficiency of Ti ionized deposition in HIPIMS, Plasma Sources Sci. Technol. 20 (2011) 035021. [49] J.T. Gudmundsson, N. Brenning, D. Lundin, U. Helmersson, High power impulse magnetron sputtering discharge, J. Vac. Sci. Technol. A 30 (2012) 030801. [50] K. Sarakinos, J. Alami, S. Konstantinidis, High power pulsed magnetron sputtering: A review on scientific and engineering state of the art, Surf. Coat. Technol. 204 (2010) 1661-1684. [51] G. Greczynskia, I. Zhirkov, I. Petrova, J.E. Greene, J. Rosena, Control of the metal/gas ion ratio incident at the substrate plane during high-power impulse magnetron sputtering of transition metals in Ar, Thin Solid Films 642 (2017) 36-40. [52] M. Samuelsson, D. Lundin, J. Jensen, M.A. Raadu, J.T. Gudmundsson, U. Helmersson, On the film density using high power impulse magnetron sputtering, Surf. Coat. Technol. 205 (2010) 591-596. [53] H. Hajihoseini, J.T. Gudmundsson, Vanadium and vanadium nitride thin films grown by high power impulse magnetron sputtering, J. Phys. D: Appl. Phys. 50 (2017) 505302. [54] J. Lin, R. Wei, A comparative study of thick TiSiCN nanocomposite coatings deposited by dcMS and HiPIMS with and without PEMS assistance, Surf. Coat. Technol. 338 (2018) 84-95. [55] D. Gall, S. Kodambaka, M. Wall, I. Petrov, J.E. Greene, Pathways of atomistic processes on TiN(001) and (111) surfaces during film growth: an ab initio study, J. Appl. Phys. 93 (2003) 9086-9094. [56] G. Abadias, W.P. Leory, S. Mahieu, D. Depla, Influence of particle and energy flux on stress and texture development in magnetron sputtered TiN films, J. Phys. D: Appl. Phys. 46 (2013) 055301. [57] J.-H. Huang, C.-H. Lin, G.-P. Yu, Texture evolution of vanadium nitride thin films, Thin Solid Films 688 (2019) 137415. [58] J. Pelleg, L.Z. Zevin, S. Lungo, N. Croitoru, Reactive-sputter-deposited TiN films on glass substrates, Thin Solid Films 197 (1991) 117-128. [59] D.G. Sangiovanni, A.B. Mei, L. Hultman, V. Chirita, I. Petrov, J.E. Greene, Ab initio molecular dynamics simulations of nitrogen/VN (001) surface reactions: vacancy-catalyzed N2 Dissociative chemisorption, N adatom migration, and N2 Desorption, J. Phys. Chem. C 120 (2016) 12503-12516. [60] C.-L. Chang, S.-G. Shih, P.-H. Chen, W.-C. Chen, C.-T. Ho, W.-Y. Wu, Effect of duty cycles on the deposition and characteristics of high power impulse magnetron sputtering deposited TiN thin films, Surf. Coat. Technol. 259 (2014) 232-237. [61] D.A. Shirley, High-resolution X-ray photoemission spectrum of the valence bands of gold, Phys. Rev. B 5 (1972) 4709-4714. [62] M.Y. Liao, Y. Gotoh, H. Tsuji, J. Ishikawa, Crystallographic structure and composition of vanadium nitride films deposited by direct sputtering of a compound target, J. Vac. Sci. Technol. A 22 (2004) 146-150. [63] B. Kościelska, A. Winiarski, W. Jurga, Structure and superconductivity of VN–SiO2 films obtained by thermal nitridation of sol–gel derived coatings, J. Non-Cryst. Solids 356 (2010) 1998-2000. [64] A.M. Glushenkov, D. Hulicova-Jurcakova, D. Llewellyn, G.Q. Lu, Y. Chen, Structure and capacitive properties of porous nanocrystalline VN prepared by temperature-programmed ammonia reduction of V2O5, Chem. Mater. 22 (2010) 914-921. [65] R.T. Haasch, T.Y. Lee, D. Gall, J.E. Greene, I. Petrov, Epitaxial VN (001) grown and analyzed in situ by XPS and UPS. I. analysis of as-deposited layers, Surf. Sci. Spectra 7 (2000) 221-232. [66] Z. Zhao, Y. Liu, H. Cao, J. Ye, S. Gao, M. Tu, Synthesis of VN nanopowders by thermal nitridation of the precursor and their characterization, J. Alloys Compd. 464 (2008) 75-80. [67] J.-G. Choi, The surface properties of vanadium compounds by X-ray photoelectron spectroscopy, Appl. Surf. Sci. 148 (1999) 64-72. [68] M.C. Biesinger, L.W. Lau, A.R. Gerson, R.S.C. Smart, Resolving surface chemical states in XPS analysis of first row transition metals, oxides and hydroxides: Sc, Ti, V, Cu and Zn, Appl. Surf. Sci. 257 (2010) 887-898. [69] P. Scherrer, Bestimmung der Grösse und der innern Struktur von Kolloidteilchen mittels Röntgenstrahlen, Gött. Nachr. 2 (1918) 98-100. [70] L.V. Azaroff, M.J. Buerger, The powder method in X-ray crystallography, MaGraw-Hill, New York, 1958. [71] W.C. Oliver, G.M. Pharr, An improved technique for determining hardness and elastic modulus using load and displacement sensing indentation experiments, J. Mater. Res. 7 (1992) 1564-1583. [72] G.G. Stoney, The Tension of Metallic Films deposited by Electrolysis, Proc. Roy. Soc. Lond. A Mat. 82 (1909) 172-175. [73] A.-N. Wang, C.-P. Chuang, G.-P. Yu, J.-H. Huang, Determination of average X-ray strain (AXS) on TiN hard coatings using cos2 αsin2 ψ X-ray diffraction method, Surf. Coat. Technol. 262 (2015) 40-47. [74] C.-H. Ma, J.-H. Huang, H. Chen, Residual stress measurement in textured thin film by grazing-incidence X-ray diffraction, Thin Solid Films 418 (2002) 73-78. [75] ICDD Kabekkodu, International Centre for Diffraction Data, 2003. PDF# 65-7236. [76] ICDD Kabekkodu, International Centre for Diffraction Data, 2003. PDF# 38-1420. [77] I.L. Singer, Mechanics and chemistry of solids in sliding contact, Langmuir 12 (1996) 4486-4491. [78] F. Ge, P. Zhu, F. Meng, Q. Xue, F. Huang, Achieving very low wear rates in binary transition-metal nitrides: The case of magnetron sputtered dense and highly oriented VN coatings, Surf. Coat. Technol. 248 (2014) 81-90. [79] J.-H. Huang, I-S. Ting, T.-W. Zheng, Evaluation of stress and energy relief efficiency of ZrN/Ti and ZrN/Zr, Surf. Coat. Technol. 434 (2022) 128224. [80] J. Goodman, Mechanics Applied to Engineering, 9th ed, Longmans Green and Company, London, 1930.
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