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作者(中文):賴柏瑋
作者(外文):Lai, Bo-Wei
論文名稱(中文):以銀離子輔助蝕刻與酸蝕刻擴孔在矽表面形成倒金字塔之研究
論文名稱(外文):Metal-Assisted Chemical Etching and Subsequent Acid Etching to Form Inverted Pyramid on Surface of Silicon Substrate
指導教授(中文):王立康
指導教授(外文):Wang, Li-Karn
口試委員(中文):陳昇暉
李明昌
口試委員(外文):Chen, Sheng-Hui
Lee, Ming-Chang
學位類別:碩士
校院名稱:國立清華大學
系所名稱:光電工程研究所
學號:108066531
出版年(民國):112
畢業學年度:111
語文別:中文
論文頁數:72
中文關鍵詞:製絨金屬輔助蝕刻倒金字塔
外文關鍵詞:TexturingMetal-Assisted-Chemical-EtchingInverted pyramid
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太陽電池自從2018、2019年開始,製程方向上便已從沙漿片往鑽石線切割邁進,在過往沙漿片上可利用簡單的酸蝕刻在表面進行製絨,但鑽石線切割片上由於切痕較深,且表面較無孔洞而使酸蝕刻較難以進行製絨,於是在鑽石線切割片上的製絨便較困難。在過往論文與研究上,會以金屬輔助蝕刻的方式在表面形成倒金字塔,但在金屬輔助的製程上仍有許多問題需要克服。
本論文以三步蝕刻的方式在表面形成倒金字塔,且與過往研究上不同的是,在製程上的金屬離子採用較高濃度的蝕刻液,在製程上可以不需加熱,便可在較短時間內形成奈米孔洞;在第二步的蝕刻液中,分別以固定濃度的蝕刻液與不同時間的蝕刻來分析孔洞的大小與後續的處理,在最後一步的地方以氫氧化鉀做最後的蝕刻。最後實驗數據的發現較高濃度的金屬離子可以產上較大的孔洞。最後再以電漿輔助沉積在表面鍍上氮化矽做反射率的量測,希望可以為金屬輔助蝕刻的貢獻做一點綿薄的心力。
Since 2018, the process of solar cells has moved from the age of slurry-wire-sawn wafers to diamond-wire-sawn wafers. In the past, acid etching can be used to make texture on the surfaces of slurry-wire-sawn wafers, but diamond-wire-sawn wafers have deep cut marks. And the surfaces are relatively free of holes so that regular acid etching is not applicable for texturing, and thus it is more difficult to produce a textured surface on the diamond-wire-sawn wafers. In previous researches, metal-assisted chemical etching was used to form inverted pyramids on the surfaces of diamond-wire-sawn silicon wafers, but there are still many problems to be overcome in the metal-assisted chemical etching process.
This paper uses a three-step silver-assisted chemical etching method to form an inverted pyramids on the surface of a diamond-wire-sawn silicon wafers.Different from the previous research here, the silver ions in the process have a higher concentration in the etching solution, which shortens the etching time period without heating. Nanopores are formed within a short time period in the first step of etching; in the second step of etching, the sizes of the holes are analyzed at a fixed concentration of etching solution for different etching time periods.Then KOH solution is used in the final step of etching to form inverted pyramids. It is found that higher concentration of silver ions can produce larger pores in the first step. Finally, plasma-enhanced chemical vapor deposition(PECVD) is used to coat silicon nitride on the surface for reflectivity measurement, hoping this study can make a little contribution on metal-assisted chemical etching.
第一章 序論1
1-1 太陽電池現況:1
1-2 研究背景:2
1-3 文獻回顧:4
1-4 研究目的:6
1-5 論文架構:6
第二章 太陽能電池原理與蝕刻製程7
2-1 半導體元件物理與特性:7
2-2 半導體的載子與復合:9
2-3 太陽電池原理:11
2-4 蝕刻製程:19
第三章 實驗規劃與流程23
3-1 實驗架構:23
3-2 實驗儀器介紹:23
3-3 實驗步驟:27
第四章 實驗結果與數據分析32
4-1 AgNO3 Etching:32
4-2 Nano-hole Restructure:36
4-3 KOH Etching:51
4-4 反射率量測:64
第五章 結論與未來方向69
5-1 結論:69
5-2 未來方向:69
參考文獻 71

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