|
[1] Y. Sun, X. Kang, Y. Zheng, J. Lu, X. Tian, K. Wei, H. Wu, W. Wang, X. Liu, and G. Zhang, “Review of the Recent Progress on GaN-Based Vertical Power Schottky Barrier Diodes (SBDs),” Electronics, vol. 8, no. 5, p. 575, 2019. [2] W. Saito, Y. Takada, M. Kuraguchi, K. Tsuda, and I. Omura, “Recessed-gate structure approach toward normally off high-Voltage AlGaN/GaN HEMT for power electronics applications,” IEEE Transactions on Electron Devices, vol. 53, no. 2, pp. 356–362, 2006. [3] Q. Si, H. Yue, M. Xiaohua, X. Yuanbin, and M. Jigang, “Enhancement-mode AlGaN/GaN HEMTs fabricated by fluorine plasma treatment,” Journal of Semiconductors, vol. 30, no. 12, p. 124002, 2009. [4] I. Hwang, J. Kim, H. S. Choi, H. Choi, J. Lee, K. Y. Kim, J.-B. Park, J. C. Lee, J. Ha, J. Oh, J. Shin, and U.-I. Chung, “p-GaN Gate HEMTs With Tungsten Gate Metal for High Threshold Voltage and Low Gate Current,” IEEE Electron Device Letters, vol. 34, no. 2, pp. 202–204, 2013. [5] M. A. Khan, J. N. Kuznia, J. M. V. Hove, N. Pan, and J. Carter, “Observation of a two‐dimensional electron gas in low pressure metalorganic chemical vapor deposited GaN‐AlxGa1−xN heterojunctions,” Applied Physics Letters, vol. 60, no. 24, pp. 3027–3029, 1992. [6] M. A. Khan, A. Bhattarai, J. N. Kuznia, and D. T. Olson, “High electron mobility transistor based on a GaN‐AlxGa1−xN heterojunction,” Applied Physics Letters, vol. 63, no. 9, pp. 1214–1215, 1993. [7] M. A. Khan, Q. Chen, C. J. Sun, J. W. Yang, M. Blasingame, M. S. Shur, and H. Park, “Enhancement and depletion mode GaN/AlGaN heterostructure field effect transistors,” Applied Physics Letters, vol. 68, no. 4, pp. 514–516, 1996. [8] N.-Q. Zhang, S. Keller, G. Parish, S. Heikman, S. Denbaars, and U. Mishra, “High breakdown GaN HEMT with overlapping gate structure,” IEEE Electron Device Letters, vol. 21, no. 9, pp. 421–423, 2000. [9] R. Thompson, T. Prunty, V. Kaper, and J. Shealy, “Performance of the AlGaN HEMT Structure With a Gate Extension,” IEEE Transactions on Electron Devices, vol. 51, no. 2, pp. 292–295, 2004. [10] K. Makiyama, T. Ohki, M. Kanamura, K. Imanishi, N. Hara, and T. Kikkawa, “High-fmaxGaN HEMT with high breakdown voltage over 100 V for millimeter-wave applications,” physica status solidi (a), vol. 204, no. 6, pp. 2054–2058, 2007. [11] L. Shen, S. Heikman, B. Moran, R. Coffie, N.-Q. Zhang, D. Buttari, I. Smorchkova, S. Keller, S. Denbaars, and U. Mishra, “AlGaN/AlN/GaN high-power microwave HEMT,” IEEE Electron Device Letters, vol. 22, no. 10, pp. 457–459, 2001. [12] Y. Cai, Y. Zhou, K. Chen, and K. Lau, “High-performance enhancement-mode AlGaN/GaN HEMTs using fluoride-based plasma treatment,” IEEE Electron Device Letters, vol. 26, no. 7, pp. 435–437, 2005. [13] T. Mizutani, M. Ito, S. Kishimoto, and F. Nakamura, “AlGaN/GaN HEMTs With Thin InGaN Cap Layer for Normally Off Operation,” IEEE Electron Device Letters, vol. 28, no. 7, pp. 549–551, 2007. [14] G. Greco, F. Iucolano, and F. Roccaforte, “Review of technology for normally-off HEMTs with p-GaN gate,” Materials Science in Semiconductor Processing, vol. 78, pp. 96–106, 2018. [15] X. Hu, G. Simin, J. Yang, M. A. Khan, R. Gaska, and M. Shur, “Enhancement mode AlGaN/GaN HFET with selectively grown pn junction gate,” Electronics Letters, vol. 36, no. 8, p. 753, 2000. [16] Y. Uemoto, M. Hikita, H. Ueno, H. Matsuo, H. Ishida, M. Yanagihara, T. Ueda, T. Tanaka, and D. Ueda, “Gate Injection Transistor (GIT)—A Normally-Off AlGaN/GaN Power Transistor Using Conductivity Modulation,” IEEE Transactions on Electron Devices, vol. 54, no. 12, pp. 3393–3399, 2007. [17] O. Hilt, F. Brunner, E. Cho, A. Knauer, E. Bahat-Treidel, and J. Wurfl, “Normally-off high-voltage p-GaN gate GaN HFET with carbon-doped buffer,” 2011 IEEE 23rd International Symposium on Power Semiconductor Devices and ICs, 2011. [18] L.-Y. Su, F. Lee, and J. J. Huang, “Enhancement-Mode GaN-Based High-Electron Mobility Transistors on the Si Substrate With a P-Type GaN Cap Layer,” IEEE Transactions on Electron Devices, vol. 61, no. 2, pp. 460–465, 2014. [19] N. E. Posthuma, S. You, H. Liang, N. Ronchi, X. Kang, D. Wellekens, Y. N. Saripalli, and S. Decoutere, “Impact of Mg out-diffusion and activation on the p-GaN gate HEMT device performance,” 2016 28th International Symposium on Power Semiconductor Devices and ICs (ISPSD), 2016. [20] R. Hao, K. Fu, G. Yu, W. Li, J. Yuan, L. Song, Z. Zhang, S. Sun, X. Li, Y. Cai, X. Zhang, and B. Zhang, “Normally-off p-GaN/AlGaN/GaN high electron mobility transistors using hydrogen plasma treatment,” Applied Physics Letters, vol. 109, no. 15, p. 152106, 2016. [21] Y. Huang, L. Zhang, Z. Cheng, Y. Zhang, Y. Ai, Y. Zhao, H. Lu, J. Wang, and J. Li, “AlGaN/GaN high electron mobility transistors with selective area grown p-GaN gates,” Journal of Semiconductors, vol. 37, no. 11, p. 114002, 2016. [22] L. Yu, L. Jia, D. Qiao, S. Lau, J. Li, J. Lin, and H. Jiang, “The origins of leaky characteristics of schottky diodes on p-GaN,” IEEE Transactions on Electron Devices, vol. 50, no. 2, pp. 292–296, 2003. [23] T.-L. Wu, D. Marcon, S. You, N. Posthuma, B. Bakeroot, S. Stoffels, M. V. Hove, G. Groeseneken, and S. Decoutere, “Forward Bias Gate Breakdown Mechanism in Enhancement-Mode p-GaN Gate AlGaN/GaN High-Electron Mobility Transistors,” IEEE Electron Device Letters, vol. 36, no. 10, pp. 1001–1003, 2015. [24] G. Greco, F. Iucolano, S. D. Franco, C. Bongiorno, A. Patti, and F. Roccaforte, “Effects of Annealing Treatments on the Properties of Al/Ti/p-GaN Interfaces for Normally OFF p-GaN HEMTs,” IEEE Transactions on Electron Devices, vol. 63, no. 7, pp. 2735–2741, 2016. [25] G. Lukens, H. Hahn, H. Kalisch, and A. Vescan, “Self-Aligned Process for Selectively Etched p-GaN-Gated AlGaN/GaN-on-Si HFETs,” IEEE Transactions on Electron Devices, vol. 65, no. 9, pp. 3732–3738, 2018. [26] X. Lu, H. Jiang, C. Liu, X. Zou, and K. M. Lau, “Off-state leakage current reduction in AlGaN/GaN high electron mobility transistors by combining surface treatment and post-gate annealing,” Semiconductor Science and Technology, vol. 31, no. 5, p. 055019, 2016. [27] A. N. Tallarico, S. Stoffels, P. Magnone, N. Posthuma, E. Sangiorgi, S. Decoutere, and C. Fiegna, “Investigation of the p-GaN Gate Breakdown in Forward-Biased GaN-Based Power HEMTs,” IEEE Electron Device Letters, vol. 38, no. 1, pp. 99–102, 2017. [28] M. Meneghini, O. Hilt, J. Wuerfl, and G. Meneghesso, “Technology and Reliability of Normally-Off GaN HEMTs with p-Type Gate,” Energies, vol. 10, no. 2, p. 153, 2017. [29] A. Stockman, E. Canato, A. Tajalli, M. Meneghini, G. Meneghesso, E. Zanoni, P. Moens, and B. Bakeroot, “On the origin of the leakage current in p-gate AlGaN/GaN HEMTs,” 2018 IEEE International Reliability Physics Symposium (IRPS), 2018. [30] T.-F. Chang, T.-C. Hsiao, C.-F. Huang, W.-H. Kuo, S.-F. Lin, G. S. Samudra, and Y. C. Liang, “Phenomenon of Drain Current Instability on p-GaN Gate AlGaN/GaN HEMTs,” IEEE Transactions on Electron Devices, vol. 62, no. 2, pp. 339–345, 2015. [31] G. Meneghesso, M. Meneghini and E. Zanoni, Gallium Nitride enabled High Frequency and High Efficiency Power Conversion, Springer International Publishing AG, 2018. [32] O. Ambacher, B. Foutz, J. Smart, J. R. Shealy, N. G. Weimann, K. Chu, M. Murphy, A. J. Sierakowski, W. J. Schaff, L. F. Eastman, R. Dimitrov, A. Mitchell, and M. Stutzmann, “Two dimensional electron gases induced by spontaneous and piezoelectric polarization in undoped and doped AlGaN/GaN heterostructures,” Journal of Applied Physics, vol. 87, no. 1, pp. 334–344, 2000. [33] J. K. Sheu, Y. K. Su, G. C. Chi, P. L. Koh, M. J. Jou, C. M. Chang, C. C. Liu, and W. C. Hung, “High-transparency Ni/Au ohmic contact to p-type GaN,” Applied Physics Letters, vol. 74, no. 16, pp. 2340–2342, 1999. [34] K.-M. Chang, J.-Y. Chu, and C.-C. Cheng, “Investigation of indium–tin-oxide ohmic contact to p-GaN and its application to high-brightness GaN-based light-emitting diodes,” Solid-State Electronics, vol. 49, no. 8, pp. 1381–1386, 2005. [35] T. Fujii, N. Tsuyukuchi, Y. Hirose, M. Iwaya, S. Kamiyama, H. Amano, and I. Akasaki, “Control of Threshold Voltage of Enhancement-Mode AlxGa1-xN/GaN Junction Heterostructure Field-Effect Transistors Using p-GaN Gate Contact,” Japanese Journal of Applied Physics, vol. 46, no. 1, pp. 115–118, 2007. [36] Y. Zhang, I. P. Smorchkova, C. R. Elsass, S. Keller, J. P. Ibbetson, S. Denbaars, U. K. Mishra, and J. Singh, “Charge control and mobility in AlGaN/GaN transistors: Experimental and theoretical studies,” Journal of Applied Physics, vol. 87, no. 11, pp. 7981–7987, 2000. [37] W. Chen, J. Zhang, B. Zhang, and K. J. Chen, “Fluorine-plasma surface treatment for gate forward leakage current reduction in AlGaN/GaN HEMTs,” Journal of Semiconductors, vol. 34, no. 2, p. 024003, 2013. [38] A. Nigam, T. N. Bhat, S. Rajamani, S. B. Dolmanan, S. Tripathy, and M. Kumar, “Effect of self-heating on electrical characteristics of AlGaN/ GaN HEMT on Si (111) substrate,” AIP Advances, vol. 7, no. 8, p. 085015, 2017. [39] T. Pu, Y. Chen, X. Li, T. Peng, X. Wang, J. Li, W. He, J. Ben, Y. Lu, X. Liu, and J.-P. Ao, “Gate structure dependent normally-off AlGaN/GaN heterostructure field-effect transistors with p-GaN cap layer,” Journal of Physics D: Applied Physics, vol. 53, no. 41, p. 415104, 2020. [40] M. Meneghini, I. Rossetto, V. Rizzato, S. Stoffels, M. V. Hove, N. Posthuma, T.-L. Wu, D. Marcon, S. Decoutere, G. Meneghesso, and E. Zanoni, “Gate Stability of GaN-Based HEMTs with P-Type Gate,” Electronics, vol. 5, no. 4, p. 14, 2016. [41] M. Tapajna, O. Hilt, E. Bahat-Treidel, J. Wurfl, and J. Kuzmik, “Gate Reliability Investigation in Normally-Off p-Type-GaN Cap/AlGaN/GaN HEMTs Under Forward Bias Stress,” IEEE Electron Device Letters, vol. 37, no. 4, pp. 385–388, 2016.
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