在物聯網、大數據、AI興起的時代，蒐集製程資料、資料大數據分析到智能化自動控制機台，成為工程師優化各類機台系統的好工具，尤其是在需要大量人力判斷、調整之設備，智慧自動化更是可以大幅提升效率、良率，達到關燈生產、無人工廠之理想目標。
本實驗室致力在雷射干涉微影設備與系統之開發與優化，在雷射干涉微影製程上可製作出各類週期性排列之微奈米等級之微結構，並在機台上設備領域中，開發出諸多優化裝置來提升結構良率與製程效率，諸如:雷射光平坦化裝置、振動抑制裝置、消色差裝置等。而在軟體方面也開發出雷射干涉微影之製程模擬系統，用以模擬雷射干涉所需之製程規格及製作時間等。
在解決諸多穩定性及製程良率的問題後，為求提升雷射干涉微影之產能及效率，本實驗室期寄結合IOT聯網之感測器與自動化機台，將過去需要大量人力進行監控的環境因素，改以多且小的感測器進行監控，在進行資料上網，來達到遠端監控的功能；另一方面，感測器系統的建立，也協助雷射干涉微影系統自動化，藉由即時回饋感測器資料來進行雷射干涉微影曝光的自動控制。
本研究旨在整合雷射干涉微影系統與物聯網功能，將感測器資料上傳至雲端實時監控，並結合過去雷射干涉微影之經驗與參數資料庫，建置自動回授之遮光器，以達成關燈生產之目標。

In the era of the Internet of Things, big data, and AI, collecting data and data analysis have become a good tool for engineers to optimize machine systems, especially those require a lot of human judgment and adjustment. Intelligent automation can greatly improve efficiency and quality, and achieve the goal of fully automated factories.
Our laboratory is committed to the development and optimization of laser interference lithography equipment and systems. Based on the integration of past laser interference lithography development experience and the concept of intelligent automation, we try to improve the performance of equipment, efficiency of judgment, and further enhance the effectiveness and experiment and production.
The purpose of this study is to improve the stability of the equipment and the flexibility of the production structure to achieve the goal of fully automated production.
In the laser interference lithography technology, the changes of the intensity, light shape, noise and other parameters of the laser light have a great impact on the microstructure. In the past, the laboratory proposed various devices and systems to enhance efficiency and productivity of laser interference lithography. However, in order to produce more various specifications automatically, integration of various optimization devices and improving stability become an urgent task.

目錄
第一章 緒論 1
1.1 前言 1
1.2 文獻回顧 2
1.2.1雷射干涉微影介紹 2
1.2.2多光束雷射干涉微影系統開發 6
1.2.3雷射光束平坦化裝置 7
1.2.4消色差干涉微影技術 8
1.2.5光型監控系統 9
1.2.6振動分析與補償 10
1.2.7感測器介面開發 11
1.3 研究動機 12
1.4 論文架構 13
第二章 研究方法 14
2.1 研究方法流程 14
2.2雷射干涉微影結構規格調變原理 15
2.2.1結構周期 15
2.2.2結構線寬 16
2.2.4 結構高度 16
2.3系統架構設計 18
2.3.1系統架構 18
2.4元件 20
2.4.1雷射 20
2.4.2 Arduino WeMosD1處理器 21
2.4.3 Veml6070光強度感測器 22
2.4.4 加速規感測器 23
2.4.5 溫溼度感測器 24
2.5感測器系統處理 25
2.5.1 Arduino IDE 25
2.5.2 Arduino資料轉換 26
2.6人機介面與網頁介面呈現 27
2.7自動曝光機制建立 28
第三章 機台測試與人機介面結果討論 29
3.1曝光參數測試流程 29
3.1.1曝光劑量實驗 30
3.2測試結果 31
3.2.1結果檢測方法 31
3.2.2測試結果 32
第四章 結論與未來規劃 49
4.1 結論 49
4.2未來規劃 52
第五章 參考文獻 53

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