光學薄膜的熱擾動是高精度干涉儀測量的限制之一。為了測量微弱的信號如重力波，應盡可能降低熱擾動，以提高檢測靈敏度。根據Fluctuation-Dissipation theorem，薄膜的熱擾動與材料的機械損耗成正比關係。因此，我們只要量測材料的機械損耗，就可以得知由薄膜引起的熱擾動影響。本實驗室致力於研究材料的機械損耗以降低熱擾動。
我們透過離子束濺鍍法研究二氧化矽和二氧化鈦薄膜。對於傳統的高反射鏡，二氧化矽是不可缺少的低折射率材料。然而，二氧化矽具有高的低溫機械損失，會導致高的熱擾動影響。因此，我們將二氧化鈦做為二氧化矽薄膜的blocking layer。當減少二氧化矽的膜層厚度時，由於長範圍Two-level system的轉變被消除了，使二氧化矽的低溫損耗產生抑制效果。
對於另一種材料，二氧化鈦是一個難以在高溫下退火的材料。因此，我們將二氧化矽做為二氧化鈦的blocking layer。藉由此方式進行退火，二氧化鈦的結晶溫度有顯著提高。在最小膜層厚度的樣品中，其退火可以增加到600℃而不結晶。最重要的是該樣品在600℃退火機械損耗可以更有效地被減少。

Thermal noise from the optical coating in the cavities of the interferometer is the limiting factors for high-precision measurement. In order to measure weak signals such as gravitational-wave, the noise should be reduced as much as possible to improve detection sensitivity. According to Fluctuation-Dissipation theorem, the thermal noise is proportional to the mechanical loss of materials. Therefore, as long as we measure the loss, we can determine the noise effect of the films. The laboratory is committed to research the loss of materials to reduce the noise of the measurement system.
We investigated the silica and the titania films for high reflection coating by ion beam sputtering. For traditional high reflection mirrors, silica is an indispensable low refractive index material. However, silica has a high cryogenic mechanical loss and hence contributes to high thermal noise. Therefore, we stacked titania as a blocking layer for silica films. When reducing the thickness of the silica layers that eliminates the transitions of the long-range two-level systems. There had a suppression effect in cryogenic loss of silica layers.
In another material, titania is a material that difficult to anneal at high temperatures. Therefore, silica becomes a blocking layer for titania films. Annealing in this way, the crystallization temperature of titania was significantly improved. In the case of the sample which has the smallest film thickness. Annealing of the sample could increase to 600oC without crystallization. The most important is that the sample which annealing at 600oC could effectively decrease the mechanical loss.

Abstract..........................................................I
摘要.............................................................II
誌謝............................................................III
圖目錄..........................................................VII
表目錄..........................................................XII
第一章、導論......................................................1
1.1前言...........................................................1
1.2研究動機.......................................................3
第二章、量測試片製程與機械損耗量測系統............................5
2.1 基板與薄膜製程................................................5
2.1-1 單晶矽懸臂設計與製程........................................5
2.2 機械損耗原理及低溫量測系統介紹................................8
2.2-1機械損耗原理.................................................8
2.2-2低溫機械損耗量測系統及流程..................................11
2.2-2-1 矽基板低溫機械損耗.......................................14
第三章、奈米多層膜...............................................15
3.1奈米多層膜特性及原理..........................................15
3.1-1奈米多層膜設計概念..........................................15
3.1-2奈米多層膜結構使退火特性提高................................16
3.1-3奈米多層膜具有可變折射係數..................................17
3.1-4 奈米多層膜藉由比重調整改變機械損耗.........................17
3.1-4-1 單層SiO2及TiO2低溫機械損耗與理論值計算...................18
3.1-4-2 19-layer(rH=0.64)奈米多層膜之機械損耗....................21
第四章、奈米多層膜抑制效應.......................................23
4.1奈米多層膜量測................................................23
4.1-1 重新設計理論值損耗.........................................23
4.1-2 19-layer與75-layer(rH=0.33)奈米多層膜TEM分析...............26
4.1-3 低溫機械損耗量測結果.......................................28
4.1-3-1 19-layer(rH=0.33)低溫機械損耗量測分析....................28
4.1-3-2 75-layer(rH=0.33)低溫機械損耗量測分析....................29
4.1-3-3 19-layer & 75-layer低溫機械損耗peak分析..................30
4.1-4 Two-level system與Molecular dynamics模擬...................32
4.1-4-1 Two level system 理論模型................................32
4.1-4-2 Molecular dynamics模擬分析...............................34
4.1-5室溫機械損耗量測結果........................................38
第五章、奈米多層膜退火效應.......................................39
5.1 奈米多層膜臨界退火實驗.......................................39
5.1-1 臨界退火問題與實驗設計.....................................39
5.1-2 XRD退火結晶量測............................................41
5.1-2-1 TiO2=1.5nm之45-layer XRD分析.............................42
5.1-2-2 TiO2=1.8nm之75-layer XRD分析.............................47
5.1-3 TiO2厚度與退火溫度關係統整.................................48
5.2 45-layer與75-layer退火TEM分析................................49
5.2-1 45-layer退火TEM分析........................................49
5.2-1-1原生氧化層擴散現象........................................51
5.2-2 75-layer退火TEM分析........................................51
5.3 奈米多層膜退火機械損耗量測...................................53
5.3-1 75-layer 退火600oC機械損耗量測分析.........................53
5.3-2 75-laye與SiO2退火600oC比較.................................55
5.3-2-1 SiO2退火機械損耗.........................................56
5.3-2-2 75-layer 退火600oC機械損耗分析...........................57
5.3-3 TiO2機械損耗探討...........................................58
5.3-4 膜層抑制效應與退火效應.....................................60
第六章、結論與未來展望...........................................61
6.1結論..........................................................61
6.2未來展望......................................................62
附錄.............................................................63
A 內文使用之試片10K到300K機械損耗.............................63
B 內文使用之試片膜層實際厚度..................................67
參考文獻.........................................................69

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