本論文將開發具大面積自動化加工之奈米3D微影系統（Nano 3D Lithography, N3L），此系統採用波長為780nm的飛秒雷射，利用聲光調變器(Acousto-optic modulator, AOM)控制雷射光能量，搭配行程100毫米的XY位移平台，用於擴大加工範圍及拼接結構，此外在XY位移平台上，搭載行程1500微米之XY軸壓電平台及行程200微米之Z軸壓電平台，能快速、精準的加工奈米級的結構。
我們提出具高速自動對焦之系統，用於降低大面積加工產生的誤差，此系統是分析像素強度，搭配演算法縮短找尋對焦面的時間。此外透過不同位置的對焦面深度，分析玻璃基板的傾斜角，建立傾斜校正系統，補償基板傾斜及不平整造成的加工誤差。
利用此技術加工疏油及疏水結構，並進行結構路徑之優化，成功縮短部分零組件的加工時間及提高結構剛性，透過拼接的方式加工結構陣列，其陣列尺寸為3 mm×3 mm，展示具大面積自動化加工之功能。

This paper set out to develop automatic large area fabrication for Nano 3D Lithography. N3L system consist of a 780 nm femtosecond fiber laser, acousto-optic modulator and two kinds of specific stage. Acousto-optic modulator be used for controlling the laser power, and 100 mm travel range XY linear translation stage be used for expanding the fabrication range also for the structure splitting. In addition, install the 1500 μm travel range XY piezo stage and 200 μm travel range Z piezo stage on the XY linear translation stage, which are able to fabricate nanoscale structure fast and precisely.
We propose a high-speed autofocus system for reducing the errors in large area fabrication. This system shorten the time of finding focus plane by analyzing pixel intensity with algorithm. Furthermore, we build a tilt correction system which can compensate the slant and roughness of the substrate by analyzing the tilt angle of the substrate.
Finally, we fabricate omniphobic surface, shorten the fabrication time and improve the structure hardness by optimizing exposure path. Moreover, we demonstrated automatic large area fabrication for Nano 3D Lithography by fabricating 3 mm×3 mm omniphobic surface.

摘要 I
目錄 III
圖目錄 IV
表目錄 VII
第一章 緒論 1
1.1 前言 1
1.2 文獻回顧 3
1.3 研究動機 12
1.4 論文架構 13
第二章 研究方法 14
2.1 雙光子吸收 14
2.2 奈米3D微影系統 18
2.3 超臨界流體乾燥機(SUPERCRITICAL POINT DRYER) 25
第三章 大面積自動化加工 28
3.1 自動對焦系統 28
3.2 基板傾斜校正 34
第四章 實驗規劃 38
4.1 疏水結構 38
4.2 疏油結構 40
第五章 實驗成果 42
5.1 疏水結構 42
5.2 疏油結構 45
第六章 結論與未來規劃 51
參考文獻 52

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