本研究的目的是為了製作場發射特性良好之碳材料作為電極端，利用此電極端來設計一個常壓電漿產生手持裝置。該裝置所具有的功能為：(1) 實驗材料或實驗設備的表面清潔；(2) 試片的電漿前處理。
本研究透過電泳沉積法(electrophoretic deposition method, EPD method)，於銅柱上沉積具有良好場發射特性之奈米碳材料作為電漿產生裝置電極端，藉由控制製程參數，如懸浮液配置、陰陽極間距離、沉積電壓、以及沉積時間，探討奈米碳材料沉積在銅電極上的結果。從實驗結果得知，當使用石墨烯與碳管之複合材料所做的電泳沉積結果擁有較好的場發射特性與附著性。
本研究所設計之電漿裝置長度為85 mm、直徑為54 mm之圓柱狀裝置，藉由機構設計使陰陽極距離間距為500 μm，此距離為場發射檢測時常用之陰陽極距離。透過施加能量後碳材料所產生的電子來使氣體擁有較低的崩潰電壓，減少產生電漿時所需能量。
本研究成功研發出手持式電漿產生裝置，驗證出有沉積碳材料之電極相較於純銅電極能有更優的電漿產生情形，並且藉由所產生之氬氣電漿對銅片做處理使其表面產生改質效果。

The purpose of this study is to develop a carbon materials deposited electrode which has good field emission property. Next we design a handheld plasma generated device based on the carbon materials deposited electrode. There are two main functions for this plasma device: (1) To clean the surface of experimental materials or equipment; (2) To pretreat samples to change the properties of the samples.
This study deposit carbon materials with good field emission property on copper electrode by electrophoretic deposition method (EPD) and find the best result by controlling process parameters such as suspension preparation, the distance between two electrodes, deposition voltage and deposition time. After doing the experiment, we discovered that when the suspension is graphene and carbon nanotube composite suspension, the result will have the best field emission property and adhesion.
The length and the diameter of the cylindrical device are 85 mm and 54 mm. The distance between two electrodes is 500 μm. This study tried to decrease the power to generate plasma by ejecting electrons from carbon materials because of its field emission property.
This study developed handheld plasma generated device successfully and then verified out the plasma can be generated much more easily by carbon materials deposited electrode. Argon plasma can be generated by this device and then do the surface treatment on copper foil to make the surface become hydrophilic.

摘要 I
Abstract II
致謝 III
目錄 VII
圖目錄 XI
表目錄 XVI
第一章 緒論 1
1.1 前言 1
1.2 研究動機 1
第二章 文獻回顧 3
2.1 電漿系統 3
2.1.1 電漿簡介 3
2.1.2 電漿產生理論 3
2.1.3 電漿系統反應方程式 5
2.1.4 平衡電漿與非平衡電漿 7
2.1.5 常壓電漿 9
2.2 場發射效應 13
2.2.1 場發射簡介 13
2.2.2 場發射理論 15
2.2.3 發射端尺寸效應 16
2.2.4 場發射遮蔽效應 20
2.3 奈米碳管 26
2.3.1 奈米碳管簡介 26
2.3.2 奈米碳管結構與特性 27
2.3.3 奈米碳管製備方式 29
2.4 石墨烯 34
2.4.1 石墨烯簡介 34
2.4.2 石墨烯結構與特性 35
2.4.3 石墨烯製備方式 36
2.5 電泳沉積法 39
2.5.1 電泳沉積法簡介 39
2.5.2 電泳沉積理論 40
2.5.3 電泳懸浮液 42
第三章 研究方法 45
3.1 實驗設計 45
3.2 實驗製程步驟 46
3.2.1 銅陰極前處理 46
3.2.2 碳管官能化處理 46
3.2.3 懸浮液製備 47
3.2.4 電泳沉積 48
3.2.5 電漿產生裝置設計 50
3.2.6 電漿產生系統 53
3.2.7 電漿產生檢測 54
3.3 實驗儀器與材料 55
3.3.1 電泳沉積 55
3.3.2 掃描式電子顯微鏡 57
3.3.3 場發射量測儀 57
3.3.4 射頻電源供應器 59
3.4 實驗藥品與氣體 60
第四章 研究結果與討論 61
4.1 奈米碳材料於平板沉積與其場發射特性 61
4.1.1 奈米碳管 + 十二烷基硫酸鈉 + 去離子水 61
4.1.2 奈米碳管 + 氯化鎂 + 乙醇 65
4.1.3 石墨烯 + 氯化鎂 + 異丙醇 69
4.1.4 奈米碳管 + 氯化鎂 + 異丙醇 71
4.1.5 石墨烯 + 奈米碳管 + 氯化鎂 + 異丙醇 74
4.2 奈米碳材料場發射輔助電漿系統測試 77
4.2.1 電源供應器對電漿產生之影響 77
4.2.2 輸出功率與氣體流量對電漿產生之影響 79
4.2.3 碳材料電極對電漿產生之影響 84
4.2.4 電漿表面處理測試 94
第五章 結論與未來展望 97
5.1 結論 97
5.2 未來展望 98
參考文獻 100

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