本研究目的為利用一步驟製程，製作出優異場發射效應之碳複合材料與混合材料，藉此縮短製程時間，並憑藉場發射之高功率與低耗能兩大優點，將本研究之碳複合材料應用於場發射平面顯示器或電子顯微鏡之電子槍發射源。
本研究方法為以鑽石粉震盪及觸媒塗佈，對矽基板進行前處理，再以微波電漿化學氣相沉積法薄膜。沉積之結果會以掃描式電子顯微鏡分析其表面形貌，確認為複合材料後，再以拉曼光譜分析其材料結構；最後以場發射量測儀量測其場發射特性。
本研究之一步驟製程，在N2：H2：CH4 = 40：51.1：20 sccm之氣體參數下，成長出了奈米碳片球複合奈米碳片薄膜。在功率1600 W的成長環境下，所成長出之複合材料擁有低起始電場2.10 V/μm。
以相同一步驟製程，氣體參數改為N2：H2：CH4 = 40：51.1：35 sccm，成長出表面形貌如繡球蔥與鹿角珊瑚之混合結構薄膜，定義其為「微米碳珊瑚」，簡稱CMC。CMC-20min試片場發射特性優異，起始電場為2.20 V/μm。觸媒無金屬顆粒同樣能成長出CMC結構，NF起始電場為2.40 V/μm，電流穩定性的表現良好，在固定電流密度1 mA/cm2下，連續量測24小時，電流仍相當穩定。本研究亦提出了微米碳珊瑚的成長機制，於日後對此新興材料之改良，奠定了基礎。

The purpose of this study is to use a one-step process to produce excellent field emission carbon composite materials and hybrid materials, thereby reducing the cost of the process. Field emission has two advantages of high power and low energy consumption. It can be applied flat-panel displays or electron emission sources of electron microscopes.
Our method is use two pre-treatment on the silicon substrate. One is ultrasonicating with diamond nanoparticle, and the other is coating with catalyst. Then we prepared carbon hybrid materials by microwave plasma chemical vapor deposition method. The surface morphology of the composites is determined by scanning electron microscopy, and then the Raman spectra are used to analyze the structure of the composites. Finally, measuring the field emission characteristics of carbon hybrid materials.
By our method, the carbon composite CNFB/CNF was grown under N2/H2/CH4 (40/51.1/20) mixed gas 140 sccm. When microwave power was 1600 W, it had a low turn electric field of 2.10 V/μm.
In the same step, the CH4 gas flow changed to 35 sccm, and then we got a new carbon hybrid film. Its surface morphology like allium giganteum and acropora, and we defined it as "Carbon micron-coral". CMC-20min had excellent field emission characteristics. Its turn-on field only had 2.20 V/μm. The catalyst without ferric nitrate can also grow CMC structure. The NFNS turn-on field was 2.40 V/μm. Measuring with constant current density 1 mA/cm2 continuously for 24 hours, the current is still quite stable. In this work growth process of CMC film growth in MPCVD have been studied.

目錄
摘要 I
Abstract II
致謝 III
目錄 VII
圖目錄 XII
表目錄 XXII
第一章 緒論 1
1.1 前言 1
1.2 研究動機 2
第二章 文獻回顧 3
2.1 場發射效應 3
2.1.1 電子發射源 3
2.1.2 場發射基礎理論 5
2.1.3 發射端之尺寸效應 6
2.1.4 場發射遮蔽效應 9
2.2 奈米碳管 16
2.2.1 奈米碳管簡介 16
2.2.2 奈米碳管的製備 19
2.2.3 奈米碳管的場發射特性 25
2.3 石墨烯 28
2.3.1 石墨烯簡介 28
2.3.2 石墨烯的製備 30
2.3.3 石墨烯的場發射特性 35
2.4 垂直石墨烯 37
2.4.1 奈米碳片 37
2.4.2 寡層石墨烯 41
2.5 人工合成鑽石 44
2.5.1 人工合成鑽石簡介 44
2.5.2 人工合成鑽石的製備 46
2.5.3 人工合成鑽石場發射特性 49
2.6 球狀碳結構 54
2.6.1 花狀碳 54
2.6.2 奈米碳片球 55
2.7 碳複合薄膜之場射特性 56
2.7.1 奈米碳管複合石墨烯 56
2.7.2 奈米碳管複合鑽石薄膜 57
2.7.3 奈米碳片複合鑽石薄膜 58
第三章 研究方法 59
3.1 實驗儀器與材料 59
3.1.1 微波電漿化學氣相沉積系統 59
3.1.2 場發射量測儀 60
3.1.3 拉曼光譜儀(Raman Spectrometer) 61
3.1.4 光譜分析儀(Optical Emission Spectrometer） 63
3.1.5 掃描式電子顯微鏡 63
3.1.6 聚焦離子束與電子束掃描式顯微鏡 64
3.1.7 穿透式電子顯微鏡 65
3.1.8 實驗藥品與氣體 66
3.2 實驗流程 67
3.3 實驗製程 68
3.3.1 試片清潔 68
3.3.2 鑽石粉前處理 68
3.3.3 溶膠凝膠法製備觸媒 69
3.3.4 旋轉塗佈觸媒 69
3.3.5 成長碳複合材料及混合材料 70



第四章 研究結果與討論 71
4.1 一步驟成長奈米碳片球複合奈米碳片 71
4.1.1 奈米碳片 72
4.1.2 奈米碳片球 72
4.1.3 奈米碳片球複合奈米碳片 73
4.1.4 奈米碳片球複合奈米碳片之場發射特姓 77
4.2 一步驟成長微米碳珊瑚 79
4.2.1 不同功率對碳珊瑚成長之影響 80
4.2.2 不同成長時間之碳珊瑚 84
4.2.3 碳珊瑚場發射特性 90
4.3 微米碳珊瑚成長機制 94
4.3.1 鉬墊片高度調整 95
4.3.2 單一前處理-塗佈觸媒 96
4.3.3 單一前處理-超音波震盪 99
4.3.4 不同前處理溶液成分 100
4.3.5 無鐵元素微米碳珊瑚場發射特姓 105
4.3.6 碳珊瑚之TEM分析 108
4.3.7 成長機制 109

第五章 結論與未來展望 114
5.1 結論 114
5.2 未來展望 115
參考文獻 116

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