奈米3D微影技術是由雙光子聚合技術優化而成，其加工精度可至數微米、奈米尺度，此技術能夠製作任意立體結構應用於各種領域，例如：製作微流道、微光學元件、組織工程或是光通訊等領域，是近年來被看好的客製化微結構加工技術。
藉由聚焦後的雷射光在光阻內產生曝光劑量，超過光阻聚合閥值的區域經過顯影之後會留下微結構，雖然擁有優異的加工精度但也因此需要較長的加工時間，若將加工參數最佳化，即可有效縮短製作時間，搭配適當的製程環境如顯影、加熱等，能夠提高成品良率以及品質。
本篇論文以幾種具指標性的微結構來做不同材料、不同加工參數之成品比較，除此之外也開發出一套劑量模擬程式，在完成樣品建模後，可以模擬出其他調整過參數的結構樣貌，有效減少實驗次數，並且能夠方便迅速地跟合作夥伴討論、修改欲製作之微結構。最後整體討論曝光路徑之設計概念、材料測試方法等，使奈米3D微影技術有更完善的發展與整合性。

Nano 3D Lithography (N3L) is optimized from two-photon polymerization (TPP), which resolution could be micrometers even several nanometers scale. This technology is able to produce any kind of stereo micro-structures such as: micro-fluidics, micro-optics, tissue engineering, and optical communication. Because it can be applied in various fields to manufacture custom-made micro structures, making this technology has been optimistic in recent years.
By focusing femtosecond laser into the photo resist, the exposed region will form microstructure by chemical crosslinking reaction and then use developer to remove the unexposed photo resist. As it has a good performance in resolution, it need much more time to produce large size or area’s microstructure. The problem of long fabrication time can be shortened by optimized the exposure path, laser power and moving velocity of the stage. Also the development time and the post exposure bake process can improve the quality of products.
In this thesis, some benchmark microstructures was made to compare the differences in process parameters setup between two negative photo resist. Besides, this study also developed a Dosage Simulation Program (DSP) to predict the appearance of micro structures, which parameters might be tuned from the original one. Instead of doing experiment every time for different designs, we can revise those parameters in advanced. This can save lots of time and reduce the consumption of supplies. Last, the design concept of the structure’s exposure path and the material testing methods have been discuss. Makes Nano 3D Lithography technology has a better development and integration in the future.

中文摘要 i
ABSTRACT ii
目錄 iii
圖目錄 v
表目錄 viii
第一章 緒論 1
1.1　雙光子聚合技術 2
1.2　文獻回顧 3
1.2.1 光點寬高分析 6
1.2.2 點間距、線間距與雷射功率對結構的影響 7
1.2.3 劑量模擬與路徑校正 10
1.3　研究動機 13
1.4　論文架構 15
第二章 硬體軟體與系統架構 16
2.1　硬體介紹 16
2.2　軟體介紹 19
2.3　加工流程 20
2.4　聲光調變器時間校正 21
第三章 劑量模擬程式 24
3.1　光束聚焦 24
3.2　建立光點資料 25
3.3　路徑檔處理與搭配 27
3.3.1 過濾無效點 27
3.3.2 空間平移 27
3.3.3 套入光點資料 28
3.3.4 閥值設定 29
3.4　成果 29
3.4.1 閥值實驗 29
3.4.2 程式測試 30
第四章　曝光路徑對結構之影響 39
4.1　連續與非連續路徑之比較 41
4.2　定功率下加工速度與加工次數搭配之比較 42
4.3　定功率下變速度之寬高比較 44
4.4　骨架型結構之功率與重複次數比較 46
4.5　線間距對劑量累積之比較 48
第五章　製程對結構之影響 51
5.1　試片製備 51
5.2　曝後烤 52
5.3　顯影 52
5.4　乾燥 52
第六章　結論與建議 55
6.1　曝光路徑之設計要點 55
6.2　光阻參數之測試方法 58
6.3　光阻化學反應機制簡述 58
參考文獻 60

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