雷射，因為其窄頻寬、高功率密度與同調輸出的特性，而成為現今研究領域最被廣泛使用的人造光源。自紅寶石雷射以來，人們對於機構設計的進步與更多樣材料的選擇，使得形態與功能各異的雷射裝置得以實現。有賴於半導體優良的光電特性與半導體製程上的進步，使得人們能夠將增益介質與共振腔以各異的材料及厚度來實現，藉由整合增益介質與共振腔這兩種原本分離的結構進而達到微縮尺寸的目的，並大量且成功地應用在消費性電子產品，如早期光碟機的讀取頭與現今臉部辨識所使用的面射型紅外光雷射。
在本論文中，我們希望循著上述邏輯，藉由整合共振機構與增益介質的方式並搭配製程上的巧思來達到更進一步的尺寸微縮。從材料的選擇開始，我們採用比一般塊材具有更大增益特性的量子磊晶層搭配三五族半導體作為增益介質。在共振腔的設計上，我們捨棄了僅控制單維厚度，如布拉格反射式共振腔的方式，進而使用包含三個維度控制的米式散射共振腔，以達到在三個維度上同時縮小體積的目的。最後，將尺寸定義完成的共振腔與增益介質複合結構取下並轉移至較低折射率的材料中，以減低對場分布的影響。
最後，我們並沒有以此方式成功製作出雷射光源。即使沒有明確跡象表示雷射的可行性，但在更加精細的條件控制後，還是具有潛在實現的可能。

LASER, the most widely used artificial light source which provide narrow bandwidth and high output power density. Since the Ruby laser, we already have a lot of different kinds of laser device with unique application by the improvement of structure design and the material engineering. In the field of semiconductor laser, we can combine the feedback resonator and gain medium within a piece rather than several separated components in original laser device which being able to miniaturize the size of it. Such idea became a big success in the commercial product, for example, optical reader of a Blu-ray disk and facial recognition by vertical cavity surface emitting laser (VCSEL). In this research, we would like to further improve this idea, combine resonator and gain medium in same piece to achieve a laser in the size of nanometers. By the calculation of Mie scattering, we can shrink the resonator size in three-dimension rather than one-dimension in normal semiconductor laser. Also we introduce quantum material to provide more efficient gain. Finally, transfer the whole device to a low refractive index material to prevent the competition of electric field of substrate. Even though we never achieve it. But there are still possibilities after more precise control of all parameters.

I. Introduction 5
I-I. LASER 5
I-II. SPASER 10
I-III. Light-matter interaction 12
I-IV. Quantum material 16
II. Calculation, Simulation and Realization 18
II-I. Prologue 18
II-II. Scattering and its coefficient 19
II- III. Energy bandgap and Schrödinger equation 22
II-IV. Mismatch with Mie theory 25
III. Fabrication and Results 30
III-I. Quantum well and its’ design 30
III- II. Fabrication flow 35
III-III. Electron beam lithography 37
III-IV. Reactive Ion Etching 41
III-V. Transferring 45
III-VI. Variety of PL measurements 56
IV. Summary and Future perspective 67
Reference 69

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